Deposition of polysiloxane coatings by runaway electrons preionized diffuse discharge in nitrogen flow

M. V. Erofeev, M. A. Shulepov, V. S. Ripenko, V. F. Tarasenko

Результат исследований: Материалы для журналарецензирование


A deposition of polysiloxane coating on titanium substrate by means of atmospheric pressure plasma enhanced chemical vapor deposition (PECVD) in a runaway electron preionized diffuse discharge (REP DD) has been investigated. The coating was produced from vapor of hexomethyldisiloxane (HMDSO) diluted in nitrogen at a flow rate of 1 nl/min. After deposition, the mechanical properties of the coatings have been measured by means of a nanoidentation. The maximum nanohardness of the coating with 3 μm thickness was 4.7 GPa. Energy dispersive analysis has shown that the coatings contain a significant content of carbon and titanium (about 52 at. %, 32 at. %, respectively) and a low content of silicon (about 16 at. %). In the FTIR spectrum, high intensity bands corresponding to stretching vibrations of the Si-O-Si, the Si(CH3)x and CH3 groups are observed, that indicates the organic and inorganic coating structure. Carbon free coating can be produced by REP DD plasma treatment of the deposited SiOxCyHz film, when REP DD operated only in nitrogen.

Язык оригиналаАнглийский
Номер статьи032069
ЖурналJournal of Physics: Conference Series
Номер выпуска3
СостояниеОпубликовано - 27 ноя 2018
Событие6th International Congress on Energy Fluxes and Radiation Effects 2018, EFRE 2018 - Tomsk, Российская Федерация
Продолжительность: 16 сен 201822 сен 2018

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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