Coating of overstoichiometric transition metal nitrides (TMN x (x > 1)) by magnetron sputtering

Jindřich Musil, Šimon Kos, Martin Jaroš, Radomr Čerstvý, Stanislav Haviar, Sergei Zenkin, Zuzana Čiperová

Результат исследований: Материалы для журналаСтатья

Выдержка

This article reports on the formation of strongly overstoichiometric ZrN x>1 and Ti(Al, V)N x>1 coatings by reactive magnetron sputtering. Problems in the formation of overstoichiometric coatings and possible ways to form strongly overstoichiometric TMN x>1 nitride coatings up to TMN x=2 dinitride coatings are discussed; here, TM are transition metals such as Ti, Zr, Mo, Ta, Nb, W, etc. The coating stoichiometry x = N/TM strongly influences its electrical and mechanical properties. The creation and properties of reactively sputtered ZrN x coatings were investigated. It was found that (1) the electrical resistivity of the ZrN x coating varies with increasing x from well electrically conducting films with x ≤ 1 through semi-conducting films with x ranging from 1 to ≤ 1.26 to non-conductive with x ≥ 1.3, showing that the stoichiometry x is a strong parameter which enables to control an electric conductivity of the coating in a wide range, (2) electrically conductive coatings with x ≤ 1 are harder than the semiconducting and electrically insulating coatings, and (3) the ZrN 2 dinitride film cannot be created due to the formation of a Zr 3 N 4 phase whose formation enthalpy is greater than that of a ZrN 2 phase. Further, it is shown that the main problem in the formation of strongly overstoichiometric TMN x>1 and dinitride TMN 2 coatings is a strong increase of ionization of the nitrogen sputtering gas to achieve a necessary high ratio N/TM > 1. Trends enabling the mastery of formation of the TMN 2 dinitride coatings are briefly outlined.

Язык оригиналаАнглийский
Номер статьиSAAD10
ЖурналJapanese Journal of Applied Physics
Том58
Номер выпускаSA
DOI
СостояниеОпубликовано - 1 фев 2019

Отпечаток

metal nitrides
Nitrides
Magnetron sputtering
Transition metals
magnetron sputtering
transition metals
coatings
Coatings
Stoichiometry
stoichiometry
electric control
Semiconducting films
semiconducting films
Conductive films
Reactive sputtering
Ionization
nitrides
Sputtering
Enthalpy
Electric properties

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Цитировать

Coating of overstoichiometric transition metal nitrides (TMN x (x > 1)) by magnetron sputtering. / Musil, Jindřich; Kos, Šimon; Jaroš, Martin; Čerstvý, Radomr; Haviar, Stanislav; Zenkin, Sergei; Čiperová, Zuzana.

В: Japanese Journal of Applied Physics, Том 58, № SA, SAAD10, 01.02.2019.

Результат исследований: Материалы для журналаСтатья

Musil, Jindřich ; Kos, Šimon ; Jaroš, Martin ; Čerstvý, Radomr ; Haviar, Stanislav ; Zenkin, Sergei ; Čiperová, Zuzana. / Coating of overstoichiometric transition metal nitrides (TMN x (x > 1)) by magnetron sputtering. В: Japanese Journal of Applied Physics. 2019 ; Том 58, № SA.
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