Coating deposition using vacuum arc and ablation metal plasma

Результат исследований: Материалы для журналаСтатья

2 Цитирования (Scopus)

Выдержка

An innovative concept in the development of advanced coating deposition and ion implantation method including an application of filtered DC metal plasma or ablation plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range 10-99% is considered. The regularities of metal ion implantation and vacuum arc metal plasma or ablation plasma deposition for conducting and insulating materials are considered. It was shown that plasma based ion implantation as well as high-concentration plasma ion implantation with compensation of ion surface sputtering by plasma deposition as well as ion-assisted coating deposition may be realized for metal and dielectric samples by variation of negative bias potential in the range of 0-4·103 V, pulse repetition rate smoothly adjusted in the range of (2-4.4) × 105 pps and pulse duration in the range of 0.5-2 μs. It was experimentally shown that at coating deposition from ablation plasma obtained by high intensity ion beam (j = 300 A/cm2, E = 350 keV, τ = 90 ns) influence on the target, the breakdown of the plasma sheet occurred at dc negative bias potential on a substrate more than 60 V. The transfer to 0.5 μs duration pulses allowed us to increase the bias potential up to - 4 kV. The possibility of high-frequency, short-pulsed plasma-immersion ion implantation and deposition method application for coating deposition from vacuum arc and ablation plasma with high adhesive strength and improved exploitation characteristics is discussed in the paper.

Язык оригиналаАнглийский
Страницы (с-по)2735-2738
Число страниц4
ЖурналSurface and Coatings Technology
Том203
Номер выпуска17-18
DOI
СостояниеОпубликовано - 15 июн 2009

Отпечаток

Vacuum deposition
vacuum deposition
Ablation
ablation
arcs
Metals
Plasmas
coatings
Coatings
Ion implantation
metals
ion implantation
Plasma deposition
pulse duration
Vacuum
Ions
Pulse repetition rate
Insulating materials
vacuum
Bias voltage

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Цитировать

Coating deposition using vacuum arc and ablation metal plasma. / Ryabchikov, A. I.; Matvienko, V. M.; Stepanov, I. B.

В: Surface and Coatings Technology, Том 203, № 17-18, 15.06.2009, стр. 2735-2738.

Результат исследований: Материалы для журналаСтатья

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