Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

3 Цитирования (Scopus)

Выдержка

Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.

Язык оригиналаАнглийский
Название основной публикацииIOP Conference Series: Materials Science and Engineering
ИздательInstitute of Physics Publishing
Том81
Издание1
DOI
СостояниеОпубликовано - 23 апр 2015
СобытиеInternational Scientific Conference on Radiation-Thermal Effects and Processes in Inorganic Materials, RTEP 2014 - Tomsk, Российская Федерация
Продолжительность: 3 ноя 20148 ноя 2014

Конференция

КонференцияInternational Scientific Conference on Radiation-Thermal Effects and Processes in Inorganic Materials, RTEP 2014
СтранаРоссийская Федерация
ГородTomsk
Период3.11.148.11.14

Отпечаток

Argon
Magnetron sputtering
Ion beams
Aluminum
Defects
Microstructure
Crystallites
X ray diffraction analysis
Microscopes
Optical properties
Crystal structure
Ions
Transmission electron microscopy

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)

Цитировать

Umnov, S. P., & Asainov, OK. (2015). Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam. В IOP Conference Series: Materials Science and Engineering (1 ред., Том 81). [012001] Institute of Physics Publishing. https://doi.org/10.1088/1757-899X/81/1/012001

Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam. / Umnov, Sergey Pavlovich; Asainov, Oleg Khaidarovich.

IOP Conference Series: Materials Science and Engineering. Том 81 1. ред. Institute of Physics Publishing, 2015. 012001.

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

Umnov, SP & Asainov, OK 2015, Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam. в IOP Conference Series: Materials Science and Engineering. 1 ред., том. 81, 012001, Institute of Physics Publishing, Tomsk, Российская Федерация, 3.11.14. https://doi.org/10.1088/1757-899X/81/1/012001
Umnov SP, Asainov OK. Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam. В IOP Conference Series: Materials Science and Engineering. 1 ред. Том 81. Institute of Physics Publishing. 2015. 012001 https://doi.org/10.1088/1757-899X/81/1/012001
Umnov, Sergey Pavlovich ; Asainov, Oleg Khaidarovich. / Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam. IOP Conference Series: Materials Science and Engineering. Том 81 1. ред. Institute of Physics Publishing, 2015.
@inproceedings{591fd8dd033d40689caeccf12993eb7c,
title = "Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam",
abstract = "Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.",
author = "Umnov, {Sergey Pavlovich} and Oleg Khaidarovich Asainov",
year = "2015",
month = "4",
day = "23",
doi = "10.1088/1757-899X/81/1/012001",
language = "English",
volume = "81",
booktitle = "IOP Conference Series: Materials Science and Engineering",
publisher = "Institute of Physics Publishing",
edition = "1",

}

TY - GEN

T1 - Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam

AU - Umnov, Sergey Pavlovich

AU - Asainov, Oleg Khaidarovich

PY - 2015/4/23

Y1 - 2015/4/23

N2 - Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.

AB - Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.

UR - http://www.scopus.com/inward/record.url?scp=84930444566&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84930444566&partnerID=8YFLogxK

U2 - 10.1088/1757-899X/81/1/012001

DO - 10.1088/1757-899X/81/1/012001

M3 - Conference contribution

AN - SCOPUS:84930444566

VL - 81

BT - IOP Conference Series: Materials Science and Engineering

PB - Institute of Physics Publishing

ER -