Выдержка
Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.
| Язык оригинала | Английский |
|---|---|
| Название основной публикации | IOP Conference Series: Materials Science and Engineering |
| Издатель | Institute of Physics Publishing |
| Том | 81 |
| Издание | 1 |
| DOI | |
| Состояние | Опубликовано - 23 апр 2015 |
| Событие | International Scientific Conference on Radiation-Thermal Effects and Processes in Inorganic Materials, RTEP 2014 - Tomsk, Российская Федерация Продолжительность: 3 ноя 2014 → 8 ноя 2014 |
Конференция
| Конференция | International Scientific Conference on Radiation-Thermal Effects and Processes in Inorganic Materials, RTEP 2014 |
|---|---|
| Страна | Российская Федерация |
| Город | Tomsk |
| Период | 3.11.14 → 8.11.14 |
Отпечаток
ASJC Scopus subject areas
- Engineering(all)
- Materials Science(all)
Цитировать
Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam. / Umnov, Sergey Pavlovich; Asainov, Oleg Khaidarovich.
IOP Conference Series: Materials Science and Engineering. Том 81 1. ред. Institute of Physics Publishing, 2015. 012001.Результат исследований: Материалы для книги/типы отчетов › Материалы для конференции
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TY - GEN
T1 - Change spectrum characteristics modification of films deposited by magnetron sputtering with the assistance of argon ions beam
AU - Umnov, Sergey Pavlovich
AU - Asainov, Oleg Khaidarovich
PY - 2015/4/23
Y1 - 2015/4/23
N2 - Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.
AB - Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.
UR - http://www.scopus.com/inward/record.url?scp=84930444566&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84930444566&partnerID=8YFLogxK
U2 - 10.1088/1757-899X/81/1/012001
DO - 10.1088/1757-899X/81/1/012001
M3 - Conference contribution
AN - SCOPUS:84930444566
VL - 81
BT - IOP Conference Series: Materials Science and Engineering
PB - Institute of Physics Publishing
ER -