Arc plasma-assisted deposition of nanocrystalline coatings

O. V. Krysina, N. N. Koval, Yu F. Ivanov, V. V. Shugurov

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

3 Цитирования (Scopus)

Аннотация

The paper considers peculiarities of vacuum arc plasma-assisted deposition of multicomponent nanocrystalline coatings based on titanium nitride. Advantages and prospects of the modified ion plasma setup used for coating deposition are described. The effect of added elements on the structural phase state and characteristics of titanium nitride-based coatings is demonstrated.

Язык оригиналаАнглийский
Название основной публикацииProceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV
Страницы537-540
Число страниц4
DOI
СостояниеОпубликовано - 2012
Событие25th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2012 - Tomsk, Российская Федерация
Продолжительность: 2 сен 20127 сен 2012

Другое

Другое25th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2012
СтранаРоссийская Федерация
ГородTomsk
Период2.9.127.9.12

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ASJC Scopus subject areas

  • Computer Networks and Communications
  • Software

Цитировать

Krysina, O. V., Koval, N. N., Ivanov, Y. F., & Shugurov, V. V. (2012). Arc plasma-assisted deposition of nanocrystalline coatings. В Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV (стр. 537-540). [6412574] https://doi.org/10.1109/DEIV.2012.6412574