Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications

Roman Elashnikov, Jaromír Háša, Lukáš Děkanovský, Jaroslav Otta, Přemysl Fitl, Václav Švorčík, Oleksiy Lyutakov

Результат исследований: Материалы для журналаСтатья


Here, we propose a plasmon-induced redistribution of a thin polymer layer as a unique way for a residual layer-free lithographic approach. In particular, we demonstrate an ultrafast area-selective fabrication method using a low-intensity visible laser irradiation to direct the polymer mass flow, under the plasmon-active substrates. Plasmon-supported substrates were created by thermal annealing of Ag thin films and covered by thin polystyrene layers. Then, laser beam writing (LBW) was applied to introduce a surface tension gradient through the local plasmon heating. As a result, polystyrene was completely removed from the irradiated place, without any residual layer. The proposed approach does not require any additional development steps, such as solvent or plasma treatment. To demonstrate the advantages of the proposed technique, we implemented the LBW-patterned structures for further spatially selective surface functionalization, including the metal deposition, spontaneous thiol grafting, and electrochemical deposition of ordered polypyrrole array.

Язык оригиналаАнглийский
Страницы (с-по)5534-5539
Число страниц6
ЖурналACS Omega
Номер выпуска3
СостояниеОпубликовано - 19 мар 2019
Опубликовано для внешнего пользованияДа

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

Fingerprint Подробные сведения о темах исследования «Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications». Вместе они формируют уникальный семантический отпечаток (fingerprint).

  • Цитировать