Application of photoelasticity for analysis of residual stresses in CDs

S. I. Gerasimov, N. S. Bachurina, N. N. Emelyanova

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

8 Цитирования (Scopus)

Выдержка

Residual stresses appeared with time due to the imperfection of the material production process. Sometimes the redistribution of residual stresses is the reason of cracks initiation in the tested object on one of the manufacturing stages or this redistribution increases them up to the critical value, when a small external load results in breakage of this object. Relaxation is the main reason of redistribution of residual stresses and it can occur without external influence or if there is heating, static and cyclic loads. Relaxation results in change of the sizes and shapes of the tested object. The dimensional stability is especially important in modern high technologies, in particular in the use of compact discs for the storage of information. Modern CDs are produced from polycarbonate, possessing an effect of birefringence. It allows to make an estimation of stresses at CDs by the method of photoelasticity. A metallized coating put on one of a CD surfaces provides ideal conditions for registration of interference picture observed in the reflected light. When investigating the stresses in CDs with the use of reflective V-type plane polariscope the solving equations become similar to those used in a photoelastic coating method. The present work discusses the results of the research of the residual stresses in CDs with various operation time produced by various firms and by different technologies (punching, laser recording). A simple optical method of the NDT of CDs at various stages of their manufacturing is offered.

Язык оригиналаАнглийский
Название основной публикацииProceedings of SPIE - The International Society for Optical Engineering
РедакторыY.V. Chugui, S.N. Bagayev, A. Weckenmann, P.H. Osanna
Страницы606-610
Число страниц5
Том4900
Издание1
DOI
СостояниеОпубликовано - 2002
СобытиеSeventh International Symposium on Laser Metrology Applied to Science, Industry, and Everyday Life - Novosibirsk, Российская Федерация
Продолжительность: 9 сен 200213 сен 2002

Другое

ДругоеSeventh International Symposium on Laser Metrology Applied to Science, Industry, and Everyday Life
СтранаРоссийская Федерация
ГородNovosibirsk
Период9.9.0213.9.02

Отпечаток

photoelasticity
Photoelasticity
residual stress
Residual stresses
Laser recording
manufacturing
Polariscopes
polariscopes
cyclic loads
static loads
dimensional stability
Coatings
Punching
Cyclic loads
Dimensional stability
crack initiation
polycarbonates
Polycarbonates
Birefringence
Nondestructive examination

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Цитировать

Gerasimov, S. I., Bachurina, N. S., & Emelyanova, N. N. (2002). Application of photoelasticity for analysis of residual stresses in CDs. В Y. V. Chugui, S. N. Bagayev, A. Weckenmann, & P. H. Osanna (Ред.), Proceedings of SPIE - The International Society for Optical Engineering (1 ред., Том 4900, стр. 606-610) https://doi.org/10.1117/12.484619

Application of photoelasticity for analysis of residual stresses in CDs. / Gerasimov, S. I.; Bachurina, N. S.; Emelyanova, N. N.

Proceedings of SPIE - The International Society for Optical Engineering. ред. / Y.V. Chugui; S.N. Bagayev; A. Weckenmann; P.H. Osanna. Том 4900 1. ред. 2002. стр. 606-610.

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

Gerasimov, SI, Bachurina, NS & Emelyanova, NN 2002, Application of photoelasticity for analysis of residual stresses in CDs. в YV Chugui, SN Bagayev, A Weckenmann & PH Osanna (ред.), Proceedings of SPIE - The International Society for Optical Engineering. 1 ред., том. 4900, стр. 606-610, Seventh International Symposium on Laser Metrology Applied to Science, Industry, and Everyday Life, Novosibirsk, Российская Федерация, 9.9.02. https://doi.org/10.1117/12.484619
Gerasimov SI, Bachurina NS, Emelyanova NN. Application of photoelasticity for analysis of residual stresses in CDs. В Chugui YV, Bagayev SN, Weckenmann A, Osanna PH, редакторы, Proceedings of SPIE - The International Society for Optical Engineering. 1 ред. Том 4900. 2002. стр. 606-610 https://doi.org/10.1117/12.484619
Gerasimov, S. I. ; Bachurina, N. S. ; Emelyanova, N. N. / Application of photoelasticity for analysis of residual stresses in CDs. Proceedings of SPIE - The International Society for Optical Engineering. редактор / Y.V. Chugui ; S.N. Bagayev ; A. Weckenmann ; P.H. Osanna. Том 4900 1. ред. 2002. стр. 606-610
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