Application of high-power ion beams to thin films deposition and stimulating mass transfer of previously implanted dopants in materials

Alexandr I. Ryabchikov, Vasily M. Matvienko, Anatoli V. Petrov, Vasily K. Struts, Yury Petrovich Usov, Anatoli S. Shlapakovski

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

1 Цитирования (Scopus)

Аннотация

The results of investigations concerning some applications of high-power ion beams (HPIBs) to materials surface modification are presented. For BPIB-based film deposition, the characteristics of obtained coatings were studied depending on deposition conditions. It has been shown that mechanical and adhesion properties of the films are improved with decreasing deposition rate. For the combined surface treatment comprising traditional ion implantation and BPIB irradiation, the mass transfer of implanted dopant was investigated at multiple implantation-irradiation cycles. It has been demonstrated that one can control the depth of occurrence and storage of the implanted dopant.

Язык оригиналаАнглийский
Название основной публикации15th International Conference on High-Power Particle Beams - Proceedings, BEAMS-2004
Страницы622-625
Число страниц4
СостояниеОпубликовано - 2004
Событие15th International Conference on High-Power Particle Beams, BEAMS-2004 - St. Petersburg, Российская Федерация
Продолжительность: 18 июл 200423 июл 2004

Другое

Другое15th International Conference on High-Power Particle Beams, BEAMS-2004
СтранаРоссийская Федерация
ГородSt. Petersburg
Период18.7.0423.7.04

ASJC Scopus subject areas

  • Nuclear and High Energy Physics

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  • Цитировать

    Ryabchikov, A. I., Matvienko, V. M., Petrov, A. V., Struts, V. K., Usov, YP., & Shlapakovski, A. S. (2004). Application of high-power ion beams to thin films deposition and stimulating mass transfer of previously implanted dopants in materials. В 15th International Conference on High-Power Particle Beams - Proceedings, BEAMS-2004 (стр. 622-625). [6220622]