Application of a Tangential Magnetic Field and Negative Repetitively Pulsed Bias for Suppression of Vacuum-Arc Copper Macroparticles

A. I. Ryabchikov, Peter Semenovich Anan'in, A. E. Shevelev

Результат исследований: Материалы для журналаСтатья

Аннотация

The joint effect of magnetic fields normal and tangential to the cathode surface and of short-pulse highfrequency bias potential of negative polarity on the accumulation of macroparticles on the potential target immersed in copper vacuum-arc plasma is studied. It is shown that the application of a vacuum-arc evaporator with the magnetic field tangential to the cathode surface reduces by 5 times generation of copper macroparticles in comparison with an axially symmetric vacuum-arc evaporator in which the magnetic field normal to the working cathode surface is used. It is established that the joint action of the tangential field and short-pulse high-frequency bias potential makes it possible to decrease by 2–3 orders of magnitude the density of copper macroparticles on the target surface.

Язык оригиналаАнглийский
Страницы (с-по)1-7
Число страниц7
ЖурналRussian Physics Journal
DOI
СостояниеПринято/в печати - 20 окт 2016

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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