Angular thickness distribution and target utilization for hot Ni target magnetron sputtering

Результат исследований: Материалы для журналаСтатья

2 Цитирования (Scopus)

Выдержка

This paper reports on the effect of the type of Ni target (hot or cooled) on the angular thickness distribution, deposition rate and target utilization (K) for magnetron sputtering. Here it is shown that a change of magnetic field distribution does not influence on the mass of the deposited material. The Ni films will have a more uniform thickness, when films are obtained by hot target sputtering. The target utilization is higher for magnetron with hot target. This suggests a new approach to increase of K for the sputtering of magnetic targets.

Язык оригиналаАнглийский
Страницы (с-по)418-420
Число страниц3
ЖурналVacuum
Том160
DOI
СостояниеОпубликовано - 1 фев 2019

Отпечаток

Magnetron sputtering
Sputtering
magnetron sputtering
Deposition rates
Film thickness
Magnetic fields
sputtering
film thickness
magnetic fields

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Цитировать

Angular thickness distribution and target utilization for hot Ni target magnetron sputtering. / Sidelev, Dmitrii V.; Krivobokov, Valery P.

В: Vacuum, Том 160, 01.02.2019, стр. 418-420.

Результат исследований: Материалы для журналаСтатья

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