A new method of layer deposition

S. G. Psakh'e, K. P. Zol'nikov, T. Yu Uvarov

    Результат исследований: Материалы для журналаСтатья

    Аннотация

    A new approach to layer-by-layer film deposition is developed based on the data of molecular dynamics modeling. The proposed deposition method makes use of a nonlinear pulse interaction with a free material (source) surface. It is shown that, provided the pulse amplitude is sufficiently large, an atomic plane is detached from the surface. Impinging on a target (substrate), the detached plane forms a monolayer coating. Combining various source materials, it is possible to obtain multilayer films with complicated compositions and structures.

    Язык оригиналаАнглийский
    Страницы (с-по)851-853
    Число страниц3
    ЖурналTechnical Physics Letters
    Том26
    Номер выпуска10
    DOI
    СостояниеОпубликовано - 1 янв 2000

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    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

    Цитировать

    Psakh'e, S. G., Zol'nikov, K. P., & Uvarov, T. Y. (2000). A new method of layer deposition. Technical Physics Letters, 26(10), 851-853. https://doi.org/10.1134/1.1321217