A new method of layer deposition

Аннотация

A new approach to layer-by-layer film deposition is developed based on the data of molecular dynamics modeling. The proposed deposition method makes use of a nonlinear pulse interaction with a free material (source) surface. It is shown that, provided the pulse amplitude is sufficiently large, an atomic plane is detached from the surface. Impinging on a target (substrate), the detached plane forms a monolayer coating. Combining various source materials, it is possible to obtain multilayer films with complicated compositions and structures.

Язык оригинала	Английский
Страницы (с-по)	851-853
Число страниц	3
Журнал	Technical Physics Letters
Том	26
Номер выпуска	10
DOI	https://doi.org/10.1134/1.1321217
Состояние	Опубликовано - 1 янв 2000

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

Доступ к документу

10.1134/1.1321217

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Цитировать

Psakh'e, S. G., Zol'nikov, K. P., & Uvarov, T. Y. (2000). A new method of layer deposition. Technical Physics Letters, 26(10), 851-853. https://doi.org/10.1134/1.1321217

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