Wettability of Thin Silicate-Containing Hydroxyapatite Films Formed by RF-Magnetron Sputtering

Svetlana Nikolaevna Gorodzha, M. A. Surmeneva, R. A. Surmenev, M. V. Gribennikov, V. F. Pichugin, A. A. Sharonova, A. A. Pustovalova, O. Prymack, M. Epple, A. Wittmar, M. Ulbricht, K. V. Gogolinskii, K. S. Kravchuk

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Using the methods of electron and atomic force microscopy, X-ray structural analysis and measurements of the wetting angle, the features of morphology, structure, contact angle and free surface energy of silicon-containing calcium-phosphate coatings formed on the substrates made from titanium VT1-0 and stainless steel 12Cr18Ni10Ti are investigated. It is shown that the coating - substrate system possesses bimodal roughness formed by the substrate microrelief and coating nanostructure, whose principal crystalline phase is represented by silicon-substituted hydroxiapatite with the size of the coherent scattering region (CSR) 18-26 nm. It is found out that the formation of a nanostructured coating on the surface of rough substrates makes them hydrophilic. The limiting angle of water wetting for the coatings formed on titanium and steel acquires the values in the following ranges: 90-92 and 101-104°, respectively, and decreases with time.

Original languageEnglish
Pages (from-to)1163-1169
Number of pages7
JournalRussian Physics Journal
Volume56
Issue number10
DOIs
Publication statusPublished - 1 Feb 2014

Fingerprint

wettability
silicates
magnetron sputtering
coatings
wetting
titanium
calcium phosphates
coherent scattering
silicon
structural analysis
surface energy
coating
stainless steels
roughness
atomic force microscopy
steels
water
electrons
x rays

Keywords

  • biocompatibility
  • calcium-phosphate coating
  • RF-magnetron sputtering
  • wetting ability

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Wettability of Thin Silicate-Containing Hydroxyapatite Films Formed by RF-Magnetron Sputtering. / Gorodzha, Svetlana Nikolaevna; Surmeneva, M. A.; Surmenev, R. A.; Gribennikov, M. V.; Pichugin, V. F.; Sharonova, A. A.; Pustovalova, A. A.; Prymack, O.; Epple, M.; Wittmar, A.; Ulbricht, M.; Gogolinskii, K. V.; Kravchuk, K. S.

In: Russian Physics Journal, Vol. 56, No. 10, 01.02.2014, p. 1163-1169.

Research output: Contribution to journalArticle

Gorodzha, SN, Surmeneva, MA, Surmenev, RA, Gribennikov, MV, Pichugin, VF, Sharonova, AA, Pustovalova, AA, Prymack, O, Epple, M, Wittmar, A, Ulbricht, M, Gogolinskii, KV & Kravchuk, KS 2014, 'Wettability of Thin Silicate-Containing Hydroxyapatite Films Formed by RF-Magnetron Sputtering', Russian Physics Journal, vol. 56, no. 10, pp. 1163-1169. https://doi.org/10.1007/s11182-014-0157-2
Gorodzha, Svetlana Nikolaevna ; Surmeneva, M. A. ; Surmenev, R. A. ; Gribennikov, M. V. ; Pichugin, V. F. ; Sharonova, A. A. ; Pustovalova, A. A. ; Prymack, O. ; Epple, M. ; Wittmar, A. ; Ulbricht, M. ; Gogolinskii, K. V. ; Kravchuk, K. S. / Wettability of Thin Silicate-Containing Hydroxyapatite Films Formed by RF-Magnetron Sputtering. In: Russian Physics Journal. 2014 ; Vol. 56, No. 10. pp. 1163-1169.
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