Wafer-scale synthesis of defined polymer brushes under ambient conditions

Tao Zhang, Yunhao Du, Jana Kalbacova, René Schubel, Raul D. Rodriguez, Tao Chen, Dietrich R.T. Zahn, Rainer Jordan

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

A method is presented that allows for the first time the preparation of highly defined polymer brush coatings on the wafer-scale under ambient conditions (room temperature, exposure to air) from a broad variety of monomers. The discovered high oxygen-tolerance of the surface-initiated Cu(0)-mediated controlled radical polymerization (SI-CuCRP) yields entire wafers homogeneously covered by a polymer brush of linear, high molar mass polymers with narrow dispersities (D = 1.1) at extremely high grafting densities (≈1 chain per nm2). The low-tech and air tolerant method requires only ≲4 mL reaction solution containing a monomer and a ligand between two facing substrates. Thus, the SI-CuCRP is scalable to any surface area with minimal costs and minimal equipment. Despite the simplicity of the method, the high endgroup fidelity of SI-CuCRP is demonstrated by the preparation of a tetrablock copolymer brush which is the first example of a higher order block copolymer brush prepared by any surface-initiated polymerization. Finally, we present a new facile lithographic technique, the copper plate proximity printing (CP3), which relies on the proximity of the bulk copper surface to the initiator-bearing substrate. The CP3 is resist- and development-free and transfers the copper plate profile (of a copper coin) directly into an image composed of a 3D polymer brush.

Original languageEnglish
Pages (from-to)8176-8183
Number of pages8
JournalPolymer Chemistry
Volume6
Issue number47
DOIs
Publication statusPublished - 21 Dec 2015
Externally publishedYes

Fingerprint

Brushes
Polymerization
Copper
Polymers
Free radical polymerization
Air
Printing
Numismatics
Bearings (structural)
Monomers
Molar mass
Substrates
Oxygen
Ligands
Costs and Cost Analysis
Equipment and Supplies
Block copolymers
Temperature
Copolymers
Coatings

ASJC Scopus subject areas

  • Bioengineering
  • Biochemistry
  • Polymers and Plastics
  • Organic Chemistry

Cite this

Zhang, T., Du, Y., Kalbacova, J., Schubel, R., Rodriguez, R. D., Chen, T., ... Jordan, R. (2015). Wafer-scale synthesis of defined polymer brushes under ambient conditions. Polymer Chemistry, 6(47), 8176-8183. https://doi.org/10.1039/c5py01274k

Wafer-scale synthesis of defined polymer brushes under ambient conditions. / Zhang, Tao; Du, Yunhao; Kalbacova, Jana; Schubel, René; Rodriguez, Raul D.; Chen, Tao; Zahn, Dietrich R.T.; Jordan, Rainer.

In: Polymer Chemistry, Vol. 6, No. 47, 21.12.2015, p. 8176-8183.

Research output: Contribution to journalArticle

Zhang, T, Du, Y, Kalbacova, J, Schubel, R, Rodriguez, RD, Chen, T, Zahn, DRT & Jordan, R 2015, 'Wafer-scale synthesis of defined polymer brushes under ambient conditions', Polymer Chemistry, vol. 6, no. 47, pp. 8176-8183. https://doi.org/10.1039/c5py01274k
Zhang, Tao ; Du, Yunhao ; Kalbacova, Jana ; Schubel, René ; Rodriguez, Raul D. ; Chen, Tao ; Zahn, Dietrich R.T. ; Jordan, Rainer. / Wafer-scale synthesis of defined polymer brushes under ambient conditions. In: Polymer Chemistry. 2015 ; Vol. 6, No. 47. pp. 8176-8183.
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