Abstract
The paper describes high broad metal ion source based on DC macroparticle filtered vacuum arc plasma generation with the DC and repetitively pulsed ion-beam extraction. This ion source can produce the metal ion beams of 0.60 m length with pulsed ion beam current up to 1.5 A at repetitively pulsed accelerating voltage of 20-40 kV and 0.2 A at 40 kV DC accelerating voltage. Results of the study of ion emission properties of high broad vacuum - arc evaporator are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ionemission properties of vacuum-arc discharge for different cathode materials are investigated. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 G on the cathode surface.
| Original language | English |
|---|---|
| Title of host publication | Advanced Materials, Synthesis, Development and Application |
| Pages | 288-291 |
| Number of pages | 4 |
| DOIs | |
| Publication status | Published - 20 Feb 2014 |
| Event | 10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013 - Tomsk, Russian Federation Duration: 23 Apr 2013 → 26 Apr 2013 |
Publication series
| Name | Advanced Materials Research |
|---|---|
| Volume | 880 |
| ISSN (Print) | 1022-6680 |
Other
| Other | 10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013 |
|---|---|
| Country | Russian Federation |
| City | Tomsk |
| Period | 23.4.13 → 26.4.13 |
Fingerprint
Keywords
- Cathodes
- Ion sources
- Plasma guns
- Plasma production
- Vacuum arcs
ASJC Scopus subject areas
- Engineering(all)
Cite this
Very broad metal ion beam source for ion implantation and coating deposition technologies. / Stepanov, Igor; Ryabchikov, Alexander; Sivin, Denis Olegovich.
Advanced Materials, Synthesis, Development and Application. 2014. p. 288-291 (Advanced Materials Research; Vol. 880).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Very broad metal ion beam source for ion implantation and coating deposition technologies
AU - Stepanov, Igor
AU - Ryabchikov, Alexander
AU - Sivin, Denis Olegovich
PY - 2014/2/20
Y1 - 2014/2/20
N2 - The paper describes high broad metal ion source based on DC macroparticle filtered vacuum arc plasma generation with the DC and repetitively pulsed ion-beam extraction. This ion source can produce the metal ion beams of 0.60 m length with pulsed ion beam current up to 1.5 A at repetitively pulsed accelerating voltage of 20-40 kV and 0.2 A at 40 kV DC accelerating voltage. Results of the study of ion emission properties of high broad vacuum - arc evaporator are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ionemission properties of vacuum-arc discharge for different cathode materials are investigated. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 G on the cathode surface.
AB - The paper describes high broad metal ion source based on DC macroparticle filtered vacuum arc plasma generation with the DC and repetitively pulsed ion-beam extraction. This ion source can produce the metal ion beams of 0.60 m length with pulsed ion beam current up to 1.5 A at repetitively pulsed accelerating voltage of 20-40 kV and 0.2 A at 40 kV DC accelerating voltage. Results of the study of ion emission properties of high broad vacuum - arc evaporator are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ionemission properties of vacuum-arc discharge for different cathode materials are investigated. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 G on the cathode surface.
KW - Cathodes
KW - Ion sources
KW - Plasma guns
KW - Plasma production
KW - Vacuum arcs
UR - http://www.scopus.com/inward/record.url?scp=84893957278&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84893957278&partnerID=8YFLogxK
U2 - 10.4028/www.scientific.net/AMR.880.288
DO - 10.4028/www.scientific.net/AMR.880.288
M3 - Conference contribution
AN - SCOPUS:84893957278
SN - 9783038350040
T3 - Advanced Materials Research
SP - 288
EP - 291
BT - Advanced Materials, Synthesis, Development and Application
ER -