Very broad metal ion beam source for ion implantation and coating deposition technologies

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The paper describes high broad metal ion source based on DC macroparticle filtered vacuum arc plasma generation with the DC and repetitively pulsed ion-beam extraction. This ion source can produce the metal ion beams of 0.60 m length with pulsed ion beam current up to 1.5 A at repetitively pulsed accelerating voltage of 20-40 kV and 0.2 A at 40 kV DC accelerating voltage. Results of the study of ion emission properties of high broad vacuum - arc evaporator are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ionemission properties of vacuum-arc discharge for different cathode materials are investigated. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 G on the cathode surface.

Original languageEnglish
Title of host publicationAdvanced Materials, Synthesis, Development and Application
Pages288-291
Number of pages4
DOIs
Publication statusPublished - 20 Feb 2014
Event10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013 - Tomsk, Russian Federation
Duration: 23 Apr 201326 Apr 2013

Publication series

NameAdvanced Materials Research
Volume880
ISSN (Print)1022-6680

Other

Other10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013
CountryRussian Federation
CityTomsk
Period23.4.1326.4.13

Fingerprint

Ion implantation
Ion beams
Metal ions
Vacuum
Coatings
Cathodes
Ion sources
Magnetic fields
Electric potential
Evaporators
Plasmas
Ions

Keywords

  • Cathodes
  • Ion sources
  • Plasma guns
  • Plasma production
  • Vacuum arcs

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Stepanov, I., Ryabchikov, A., & Sivin, D. O. (2014). Very broad metal ion beam source for ion implantation and coating deposition technologies. In Advanced Materials, Synthesis, Development and Application (pp. 288-291). (Advanced Materials Research; Vol. 880). https://doi.org/10.4028/www.scientific.net/AMR.880.288

Very broad metal ion beam source for ion implantation and coating deposition technologies. / Stepanov, Igor; Ryabchikov, Alexander; Sivin, Denis Olegovich.

Advanced Materials, Synthesis, Development and Application. 2014. p. 288-291 (Advanced Materials Research; Vol. 880).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Stepanov, I, Ryabchikov, A & Sivin, DO 2014, Very broad metal ion beam source for ion implantation and coating deposition technologies. in Advanced Materials, Synthesis, Development and Application. Advanced Materials Research, vol. 880, pp. 288-291, 10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013, Tomsk, Russian Federation, 23.4.13. https://doi.org/10.4028/www.scientific.net/AMR.880.288
Stepanov, Igor ; Ryabchikov, Alexander ; Sivin, Denis Olegovich. / Very broad metal ion beam source for ion implantation and coating deposition technologies. Advanced Materials, Synthesis, Development and Application. 2014. pp. 288-291 (Advanced Materials Research).
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