Very broad metal ion beam source for ion implantation and coating deposition technologies

Igor Stepanov, Alexander Ryabchikov, Denis Olegovich Sivin

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The paper describes high broad metal ion source based on DC macroparticle filtered vacuum arc plasma generation with the DC and repetitively pulsed ion-beam extraction. This ion source can produce the metal ion beams of 0.60 m length with pulsed ion beam current up to 1.5 A at repetitively pulsed accelerating voltage of 20-40 kV and 0.2 A at 40 kV DC accelerating voltage. Results of the study of ion emission properties of high broad vacuum - arc evaporator are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ionemission properties of vacuum-arc discharge for different cathode materials are investigated. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 G on the cathode surface.

Original languageEnglish
Title of host publicationAdvanced Materials, Synthesis, Development and Application
Pages288-291
Number of pages4
DOIs
Publication statusPublished - 20 Feb 2014
Event10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013 - Tomsk, Russian Federation
Duration: 23 Apr 2013 → 26 Apr 2013

Publication series

NameAdvanced Materials Research
Volume880
ISSN (Print)1022-6680

Other

Other10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013
CountryRussian Federation
CityTomsk
Period23.4.13 → 26.4.13

Keywords

  • Cathodes
  • Ion sources
  • Plasma guns
  • Plasma production
  • Vacuum arcs

ASJC Scopus subject areas

  • Engineering(all)

Access to Document

Other files and links

Fingerprint Dive into the research topics of 'Very broad metal ion beam source for ion implantation and coating deposition technologies'. Together they form a unique fingerprint.

Cite this