Very broad metal ion beam source for ion implantation and coating deposition technologies

Abstract

The paper describes high broad metal ion source based on DC macroparticle filtered vacuum arc plasma generation with the DC and repetitively pulsed ion-beam extraction. This ion source can produce the metal ion beams of 0.60 m length with pulsed ion beam current up to 1.5 A at repetitively pulsed accelerating voltage of 20-40 kV and 0.2 A at 40 kV DC accelerating voltage. Results of the study of ion emission properties of high broad vacuum - arc evaporator are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ionemission properties of vacuum-arc discharge for different cathode materials are investigated. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 G on the cathode surface.

Original language	English
Title of host publication	Advanced Materials, Synthesis, Development and Application
Pages	288-291
Number of pages	4
DOIs	https://doi.org/10.4028/www.scientific.net/AMR.880.288
Publication status	Published - 20 Feb 2014
Event	10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013 - Tomsk, Russian Federation Duration: 23 Apr 2013 → 26 Apr 2013

Publication series

Name	Advanced Materials Research
Volume	880
ISSN (Print)	1022-6680

Other

Other	10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013
Country	Russian Federation
City	Tomsk
Period	23.4.13 → 26.4.13

Keywords

Cathodes
Ion sources
Plasma guns
Plasma production
Vacuum arcs

ASJC Scopus subject areas

Engineering(all)

Access to Document

10.4028/www.scientific.net/AMR.880.288

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Cite this

Stepanov, I., Ryabchikov, A., & Sivin, D. O. (2014). Very broad metal ion beam source for ion implantation and coating deposition technologies. In Advanced Materials, Synthesis, Development and Application (pp. 288-291). (Advanced Materials Research; Vol. 880). https://doi.org/10.4028/www.scientific.net/AMR.880.288

Stepanov, I , Ryabchikov, A & Sivin, DO 2014, Very broad metal ion beam source for ion implantation and coating deposition technologies. in Advanced Materials, Synthesis, Development and Application. Advanced Materials Research, vol. 880, pp. 288-291, 10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013, Tomsk, Russian Federation, 23.4.13. https://doi.org/10.4028/www.scientific.net/AMR.880.288

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abstract = "The paper describes high broad metal ion source based on DC macroparticle filtered vacuum arc plasma generation with the DC and repetitively pulsed ion-beam extraction. This ion source can produce the metal ion beams of 0.60 m length with pulsed ion beam current up to 1.5 A at repetitively pulsed accelerating voltage of 20-40 kV and 0.2 A at 40 kV DC accelerating voltage. Results of the study of ion emission properties of high broad vacuum - arc evaporator are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ionemission properties of vacuum-arc discharge for different cathode materials are investigated. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 G on the cathode surface.",

keywords = "Cathodes, Ion sources, Plasma guns, Plasma production, Vacuum arcs",

author = "Igor Stepanov and Alexander Ryabchikov and Sivin, {Denis Olegovich}",

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AB - The paper describes high broad metal ion source based on DC macroparticle filtered vacuum arc plasma generation with the DC and repetitively pulsed ion-beam extraction. This ion source can produce the metal ion beams of 0.60 m length with pulsed ion beam current up to 1.5 A at repetitively pulsed accelerating voltage of 20-40 kV and 0.2 A at 40 kV DC accelerating voltage. Results of the study of ion emission properties of high broad vacuum - arc evaporator are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ionemission properties of vacuum-arc discharge for different cathode materials are investigated. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 G on the cathode surface.

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