TY - GEN
T1 - Very broad metal ion beam source for ion implantation and coating deposition technologies
AU - Stepanov, Igor
AU - Ryabchikov, Alexander
AU - Sivin, Denis Olegovich
PY - 2014/2/20
Y1 - 2014/2/20
N2 - The paper describes high broad metal ion source based on DC macroparticle filtered vacuum arc plasma generation with the DC and repetitively pulsed ion-beam extraction. This ion source can produce the metal ion beams of 0.60 m length with pulsed ion beam current up to 1.5 A at repetitively pulsed accelerating voltage of 20-40 kV and 0.2 A at 40 kV DC accelerating voltage. Results of the study of ion emission properties of high broad vacuum - arc evaporator are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ionemission properties of vacuum-arc discharge for different cathode materials are investigated. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 G on the cathode surface.
AB - The paper describes high broad metal ion source based on DC macroparticle filtered vacuum arc plasma generation with the DC and repetitively pulsed ion-beam extraction. This ion source can produce the metal ion beams of 0.60 m length with pulsed ion beam current up to 1.5 A at repetitively pulsed accelerating voltage of 20-40 kV and 0.2 A at 40 kV DC accelerating voltage. Results of the study of ion emission properties of high broad vacuum - arc evaporator are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ionemission properties of vacuum-arc discharge for different cathode materials are investigated. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 G on the cathode surface.
KW - Cathodes
KW - Ion sources
KW - Plasma guns
KW - Plasma production
KW - Vacuum arcs
UR - http://www.scopus.com/inward/record.url?scp=84893957278&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84893957278&partnerID=8YFLogxK
U2 - 10.4028/www.scientific.net/AMR.880.288
DO - 10.4028/www.scientific.net/AMR.880.288
M3 - Conference contribution
AN - SCOPUS:84893957278
SN - 9783038350040
T3 - Advanced Materials Research
SP - 288
EP - 291
BT - Advanced Materials, Synthesis, Development and Application
T2 - 10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013
Y2 - 23 April 2013 through 26 April 2013
ER -