Vacuum arc ion and plasma source Raduga-5. Technological applications

A. I. Ryabchikov, I. B. Stepanov, S. V. Dektyarev, I. A. Shulepov, E. I. Lukonin, D. O. Sivin

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The paper discusses examples of realizing the regimes of high-intensity and high-concentration ion implantation, and plasma deposition of coatings including the conditions of dynamic ion mixing using "Raduga-5", a source of accelerated ions and plasma based on the DC vacuum arc discharge. It is shown that when a target is treated with high average power beams, it is possible to dope a material at depths exceeding the projective ion range by an order of magnitude. Features of ion beam application at different stages of ion plasma deposition of coatings are considered. Examples are given for the formation of wide transition layers between the coating and the substrate under conditions of intensive ion mixing. Mechanisms of change in the properties of the coatings formed with decreasing microparticle fractions in the arc plasma stream are considered.

Original language	English
Title of host publication	5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	380-383
Number of pages	4
Volume	1
ISBN (Print)	0780370082, 9780780370081
DOIs	https://doi.org/10.1109/KORUS.2001.975158
Publication status	Published - 2001
Event	5th Korea-Russia International Symposium on Science and Technology, KORUS 2001 - Tomsk, Russian Federation Duration: 26 Jun 2001 → 3 Jul 2001

Other

Other	5th Korea-Russia International Symposium on Science and Technology, KORUS 2001
Country	Russian Federation
City	Tomsk
Period	26.6.01 → 3.7.01

Fingerprint

Keywords

coatings
ion current
plasma filter
Vacuum-arc

ASJC Scopus subject areas

Clinical Biochemistry
Computer Networks and Communications
Biotechnology
Civil and Structural Engineering
Mechanics of Materials
Electronic, Optical and Magnetic Materials
Materials Chemistry
Surfaces, Coatings and Films

Cite this

Ryabchikov, A. I., Stepanov, I. B., Dektyarev, S. V., Shulepov, I. A., Lukonin, E. I., & Sivin, D. O. (2001). Vacuum arc ion and plasma source Raduga-5. Technological applications. In 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001 (Vol. 1, pp. 380-383). [975158] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/KORUS.2001.975158

Vacuum arc ion and plasma source Raduga-5. Technological applications. / Ryabchikov, A. I.; Stepanov, I. B.; Dektyarev, S. V.; Shulepov, I. A.; Lukonin, E. I.; Sivin, D. O.

5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001. Vol. 1 Institute of Electrical and Electronics Engineers Inc., 2001. p. 380-383 975158.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Ryabchikov, AI , Stepanov, IB , Dektyarev, SV, Shulepov, IA, Lukonin, EI & Sivin, DO 2001, Vacuum arc ion and plasma source Raduga-5. Technological applications. in 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001. vol. 1, 975158, Institute of Electrical and Electronics Engineers Inc., pp. 380-383, 5th Korea-Russia International Symposium on Science and Technology, KORUS 2001, Tomsk, Russian Federation, 26.6.01. https://doi.org/10.1109/KORUS.2001.975158

Ryabchikov AI , Stepanov IB , Dektyarev SV, Shulepov IA, Lukonin EI, Sivin DO. Vacuum arc ion and plasma source Raduga-5. Technological applications. In 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001. Vol. 1. Institute of Electrical and Electronics Engineers Inc. 2001. p. 380-383. 975158 https://doi.org/10.1109/KORUS.2001.975158

@inproceedings{be8db35e426847699eeaad0fa2d10406,

title = "Vacuum arc ion and plasma source Raduga-5. Technological applications",

abstract = "The paper discusses examples of realizing the regimes of high-intensity and high-concentration ion implantation, and plasma deposition of coatings including the conditions of dynamic ion mixing using {"}Raduga-5{"}, a source of accelerated ions and plasma based on the DC vacuum arc discharge. It is shown that when a target is treated with high average power beams, it is possible to dope a material at depths exceeding the projective ion range by an order of magnitude. Features of ion beam application at different stages of ion plasma deposition of coatings are considered. Examples are given for the formation of wide transition layers between the coating and the substrate under conditions of intensive ion mixing. Mechanisms of change in the properties of the coatings formed with decreasing microparticle fractions in the arc plasma stream are considered.",

keywords = "coatings, ion current, plasma filter, Vacuum-arc",

author = "Ryabchikov, {A. I.} and Stepanov, {I. B.} and Dektyarev, {S. V.} and Shulepov, {I. A.} and Lukonin, {E. I.} and Sivin, {D. O.}",

year = "2001",

doi = "10.1109/KORUS.2001.975158",

language = "English",

isbn = "0780370082",

volume = "1",

pages = "380--383",

booktitle = "5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "5th Korea-Russia International Symposium on Science and Technology, KORUS 2001 ; Conference date: 26-06-2001 Through 03-07-2001",

}

TY - GEN

T1 - Vacuum arc ion and plasma source Raduga-5. Technological applications

AU - Ryabchikov, A. I.

AU - Stepanov, I. B.

AU - Dektyarev, S. V.

AU - Shulepov, I. A.

AU - Lukonin, E. I.

AU - Sivin, D. O.

PY - 2001

Y1 - 2001

N2 - The paper discusses examples of realizing the regimes of high-intensity and high-concentration ion implantation, and plasma deposition of coatings including the conditions of dynamic ion mixing using "Raduga-5", a source of accelerated ions and plasma based on the DC vacuum arc discharge. It is shown that when a target is treated with high average power beams, it is possible to dope a material at depths exceeding the projective ion range by an order of magnitude. Features of ion beam application at different stages of ion plasma deposition of coatings are considered. Examples are given for the formation of wide transition layers between the coating and the substrate under conditions of intensive ion mixing. Mechanisms of change in the properties of the coatings formed with decreasing microparticle fractions in the arc plasma stream are considered.

AB - The paper discusses examples of realizing the regimes of high-intensity and high-concentration ion implantation, and plasma deposition of coatings including the conditions of dynamic ion mixing using "Raduga-5", a source of accelerated ions and plasma based on the DC vacuum arc discharge. It is shown that when a target is treated with high average power beams, it is possible to dope a material at depths exceeding the projective ion range by an order of magnitude. Features of ion beam application at different stages of ion plasma deposition of coatings are considered. Examples are given for the formation of wide transition layers between the coating and the substrate under conditions of intensive ion mixing. Mechanisms of change in the properties of the coatings formed with decreasing microparticle fractions in the arc plasma stream are considered.

KW - coatings

KW - ion current

KW - plasma filter

KW - Vacuum-arc

UR - http://www.scopus.com/inward/record.url?scp=84961832176&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84961832176&partnerID=8YFLogxK

U2 - 10.1109/KORUS.2001.975158

DO - 10.1109/KORUS.2001.975158

M3 - Conference contribution

AN - SCOPUS:84961832176

SN - 0780370082

SN - 9780780370081

VL - 1

SP - 380

EP - 383

BT - 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 5th Korea-Russia International Symposium on Science and Technology, KORUS 2001

Y2 - 26 June 2001 through 3 July 2001

ER -

Access to Document

10.1109/KORUS.2001.975158