Abstract
The paper discusses examples of realizing the regimes of high-intensity and high-concentration ion implantation, and plasma deposition of coatings including the conditions of dynamic ion mixing using "Raduga-5", a source of accelerated ions and plasma based on the DC vacuum arc discharge. It is shown that when a target is treated with high average power beams, it is possible to dope a material at depths exceeding the projective ion range by an order of magnitude. Features of ion beam application at different stages of ion plasma deposition of coatings are considered. Examples are given for the formation of wide transition layers between the coating and the substrate under conditions of intensive ion mixing. Mechanisms of change in the properties of the coatings formed with decreasing microparticle fractions in the arc plasma stream are considered.
| Original language | English |
|---|---|
| Title of host publication | 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001 |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 380-383 |
| Number of pages | 4 |
| Volume | 1 |
| ISBN (Print) | 0780370082, 9780780370081 |
| DOIs | |
| Publication status | Published - 2001 |
| Event | 5th Korea-Russia International Symposium on Science and Technology, KORUS 2001 - Tomsk, Russian Federation Duration: 26 Jun 2001 → 3 Jul 2001 |
Other
| Other | 5th Korea-Russia International Symposium on Science and Technology, KORUS 2001 |
|---|---|
| Country | Russian Federation |
| City | Tomsk |
| Period | 26.6.01 → 3.7.01 |
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Keywords
- coatings
- ion current
- plasma filter
- Vacuum-arc
ASJC Scopus subject areas
- Clinical Biochemistry
- Computer Networks and Communications
- Biotechnology
- Civil and Structural Engineering
- Mechanics of Materials
- Electronic, Optical and Magnetic Materials
- Materials Chemistry
- Surfaces, Coatings and Films
Cite this
Vacuum arc ion and plasma source Raduga-5. Technological applications. / Ryabchikov, A. I.; Stepanov, I. B.; Dektyarev, S. V.; Shulepov, I. A.; Lukonin, E. I.; Sivin, D. O.
5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001. Vol. 1 Institute of Electrical and Electronics Engineers Inc., 2001. p. 380-383 975158.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Vacuum arc ion and plasma source Raduga-5. Technological applications
AU - Ryabchikov, A. I.
AU - Stepanov, I. B.
AU - Dektyarev, S. V.
AU - Shulepov, I. A.
AU - Lukonin, E. I.
AU - Sivin, D. O.
PY - 2001
Y1 - 2001
N2 - The paper discusses examples of realizing the regimes of high-intensity and high-concentration ion implantation, and plasma deposition of coatings including the conditions of dynamic ion mixing using "Raduga-5", a source of accelerated ions and plasma based on the DC vacuum arc discharge. It is shown that when a target is treated with high average power beams, it is possible to dope a material at depths exceeding the projective ion range by an order of magnitude. Features of ion beam application at different stages of ion plasma deposition of coatings are considered. Examples are given for the formation of wide transition layers between the coating and the substrate under conditions of intensive ion mixing. Mechanisms of change in the properties of the coatings formed with decreasing microparticle fractions in the arc plasma stream are considered.
AB - The paper discusses examples of realizing the regimes of high-intensity and high-concentration ion implantation, and plasma deposition of coatings including the conditions of dynamic ion mixing using "Raduga-5", a source of accelerated ions and plasma based on the DC vacuum arc discharge. It is shown that when a target is treated with high average power beams, it is possible to dope a material at depths exceeding the projective ion range by an order of magnitude. Features of ion beam application at different stages of ion plasma deposition of coatings are considered. Examples are given for the formation of wide transition layers between the coating and the substrate under conditions of intensive ion mixing. Mechanisms of change in the properties of the coatings formed with decreasing microparticle fractions in the arc plasma stream are considered.
KW - coatings
KW - ion current
KW - plasma filter
KW - Vacuum-arc
UR - http://www.scopus.com/inward/record.url?scp=84961832176&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84961832176&partnerID=8YFLogxK
U2 - 10.1109/KORUS.2001.975158
DO - 10.1109/KORUS.2001.975158
M3 - Conference contribution
SN - 0780370082
SN - 9780780370081
VL - 1
SP - 380
EP - 383
BT - 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001
PB - Institute of Electrical and Electronics Engineers Inc.
ER -