This article describes a new modification of high current ion and plasma source Raduga 5. A dc vacuum arc is used to generate plasma. Generation of accelerated ion beams is realized in the Raduga 5 in a repetitively pulsed mode with the pulse repetition rate up to 200 pps, the pulse duration up to 400 μs and the accelerating voltage up to 50 kV. To clean the vacuum arc plasma from the microparticle fraction of the products of the explosive cathode emission of the arc evaporator a new version of a straight-line plasma filter is used. This article describes a new version of the accelerating diode which works under conditions of high thermal loads with a continuous metal plasma flow and repetitively pulsed formation of an accelerated ion beams. A simultaneous generation of a metal plasma flow and pulse beams of accelerated ions in the Raduga 5 source ensures realization of the technologies of an ion assisted metal plasma deposition, ion implantation under ion sputtering compensation by metal plasma deposition and ion implantation. The experimental data on different technological regimes of the source are presented in this article. Potential areas of the perspective application of the ion and plasma source Raduga 5 of ion and ion-plasma treatment of different materials are discussed.
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