Use of underpotential deposition for evaluation of overpotential deposition kinetics of reactive metals

E. Guerra, G. H. Kelsall, M. Bestetti, D. Dreisinger, K. Wong, K. A.R. Mitchell, D. Bizzotto

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

The underpotential deposition (UPD) of Zn onto Pt is shown to produce an electrode surface which is suitable for the evaluation of Zn overpotential kinetics. The UPD of Zn onto polycrystalline Pt was characterized in acidic and neutral sulfate solutions using voltammetric charge measurements and X-ray photoelectron spectroscopy. The charge density for UPD Zn deposition on platinum from neutral sulfate solution was estimated to be 260 ± 30 μC cm-2, consistent with a monolayer. The decrease in H2 evolution rates provided further evidence of the formation of Zn UPD layer. Evidence for the formation of a Zn-Pt alloy, resulting from polarization of the Pt electrode at a potential between the Zn UPD and overpotential deposition potentials is also presented. The alloy was oxidized at the same potential as the Pt substrate, illustrating the large interaction between Zn and Pt due to the small crystallographic misfit. The alloy also decreased H2 evolution rates, relative to the Pt substrate. The use of such a modified substrate for measurement of kinetic parameters for metal deposition is described and the results obtained are shown to compare favorably with the literature values.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume151
Issue number1
DOIs
Publication statusPublished - 2004
Externally publishedYes

Fingerprint

Metals
Kinetics
evaluation
kinetics
metals
Sulfates
sulfates
Substrates
Electrodes
electrodes
Platinum
Charge density
Kinetic parameters
Monolayers
platinum
X ray photoelectron spectroscopy
photoelectron spectroscopy
Polarization
polarization
x rays

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Materials Chemistry
  • Electrochemistry

Cite this

Use of underpotential deposition for evaluation of overpotential deposition kinetics of reactive metals. / Guerra, E.; Kelsall, G. H.; Bestetti, M.; Dreisinger, D.; Wong, K.; Mitchell, K. A.R.; Bizzotto, D.

In: Journal of the Electrochemical Society, Vol. 151, No. 1, 2004.

Research output: Contribution to journalArticle

Guerra, E. ; Kelsall, G. H. ; Bestetti, M. ; Dreisinger, D. ; Wong, K. ; Mitchell, K. A.R. ; Bizzotto, D. / Use of underpotential deposition for evaluation of overpotential deposition kinetics of reactive metals. In: Journal of the Electrochemical Society. 2004 ; Vol. 151, No. 1.
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AU - Mitchell, K. A.R.

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