Use of a thin liquid film moving under the action of gas flow in a mini-channel for removing high heat fluxes

Dmitry Zaitsev, Egor Tkachenko, Evgeniy Orlik, Oleg Kabov

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Intensively evaporating liquid films shear-driven in a mini- or micro-channel under the action of cocurrent gas flow are promising for the use in modern cooling systems of semiconductor devices. In this work, we investigated the influence of liquid and gas flow rates on the critical heat flux in a locally heated film of water, moving under the action of air flow in a mini-channel. In experiments a record value of critical heat flux of 870 W/cm2 was reached. Heat spreading into the substrate and heat losses to the atmosphere in total do not exceed 25 % at heat fluxes above 400 W/cm2. A comparison with the critical heat flux for water flow boiling in the channel shows that, for shear-driven liquid films the critical heat flux is almost an order of magnitude higher.

Original languageEnglish
Article number01037
JournalMATEC Web of Conferences
Volume92
DOIs
Publication statusPublished - 21 Dec 2016
Externally publishedYes
Event2016 Thermophysical Basis of Energy Technologies, TBET 2016 - Tomsk, Russian Federation
Duration: 26 Oct 201628 Oct 2016

Fingerprint

Liquid films
Flow of gases
Heat flux
Thin films
Water
Semiconductor devices
Cooling systems
Heat losses
Boiling liquids
Flow rate
Liquids
Substrates
Air
Experiments

ASJC Scopus subject areas

  • Chemistry(all)
  • Engineering(all)
  • Materials Science(all)

Cite this

Use of a thin liquid film moving under the action of gas flow in a mini-channel for removing high heat fluxes. / Zaitsev, Dmitry; Tkachenko, Egor; Orlik, Evgeniy; Kabov, Oleg.

In: MATEC Web of Conferences, Vol. 92, 01037, 21.12.2016.

Research output: Contribution to journalArticle

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