Tribological properties and oxidation resistance of tungsten and tungsten nitride films at temperatures up to 500 °C

D. Javdošňák, J. Musil, Z. Soukup, S. Haviar, R. Čerstvý, J. Houska

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The paper reports on the structure, microstructure, mechanical and tribological properties and oxidation resistance of WNx films with a stoichiometry x = [N]/[W] ranging from 0 to 1.5 prepared by magnetron sputtering. It was found that (i) films with x ≤ 0.20 exhibit α-W structure and columnar microstructure, while films with x ≥ 0.27 exhibit β-W2N or δ-WN structure and fine-grained microstructure, (ii) the hardness H and hardness to effective Young's modulus H/E strongly affect the tribological properties of the films. Furthermore, we investigate and discuss how the tribological properties are affected by the humidity and by the film oxidation. The oxidation is expressed in terms of the thickness of the WO3 scale, and is shown to be significantly different for x ≤ 0.20 and x ≥ 0.27 WNx films.

Original languageEnglish
Pages (from-to)211-220
Number of pages10
JournalTribology International
DOIs
Publication statusPublished - 1 Apr 2019

Fingerprint

Tungsten
oxidation resistance
Oxidation resistance
Nitrides
nitrides
tungsten
Temperature
microstructure
Microstructure
temperature
hardness
Hardness
Oxidation
oxidation
Stoichiometry
Magnetron sputtering
humidity
stoichiometry
modulus of elasticity
Atmospheric humidity

Keywords

  • Friction measurement
  • Hard thin films
  • High temperature lubrication
  • Wear measurement

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Tribological properties and oxidation resistance of tungsten and tungsten nitride films at temperatures up to 500 °C. / Javdošňák, D.; Musil, J.; Soukup, Z.; Haviar, S.; Čerstvý, R.; Houska, J.

In: Tribology International, 01.04.2019, p. 211-220.

Research output: Contribution to journalArticle

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AU - Čerstvý, R.

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AB - The paper reports on the structure, microstructure, mechanical and tribological properties and oxidation resistance of WNx films with a stoichiometry x = [N]/[W] ranging from 0 to 1.5 prepared by magnetron sputtering. It was found that (i) films with x ≤ 0.20 exhibit α-W structure and columnar microstructure, while films with x ≥ 0.27 exhibit β-W2N or δ-WN structure and fine-grained microstructure, (ii) the hardness H and hardness to effective Young's modulus H/E∗ strongly affect the tribological properties of the films. Furthermore, we investigate and discuss how the tribological properties are affected by the humidity and by the film oxidation. The oxidation is expressed in terms of the thickness of the WO3 scale, and is shown to be significantly different for x ≤ 0.20 and x ≥ 0.27 WNx films.

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