Titanium oxynitride thin films deposited by the reactive magnetron sputtering

Structure and physical-mechanical properties

N. Morozova, Maxim Evgenievich Konishchev, Alla Alexandrovna Pustovalova, Yu Bykova, I. Grebneva, O. Kuzmin, V. Pichugin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

The physical-mechanical properties of titanium oxides and oxynitride films synthesized by pulsed magnetron reactive sputtering deposition technique were investigated. Optical emission spectroscopy was used to characterize magnetron plasma and determine an appropriate regime of films deposition. The structure and surface chemical and physical properties of the films were characterized by X-ray diffraction, Auger electron spectroscopy, atomic force microscopy (AFM). Mechanical characteristics of obtained films which include their roughness, nano-hardness (H) and Young's modulus (E) were studied.

Original languageEnglish
Title of host publicationProceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012
DOIs
Publication statusPublished - 2012
Event2012 7th International Forum on Strategic Technology, IFOST 2012 - Tomsk, Russian Federation
Duration: 18 Sep 201221 Sep 2012

Other

Other2012 7th International Forum on Strategic Technology, IFOST 2012
CountryRussian Federation
CityTomsk
Period18.9.1221.9.12

Fingerprint

Reactive sputtering
Magnetron sputtering
Titanium
Thin films
Mechanical properties
Nanohardness
Optical emission spectroscopy
Titanium oxides
Auger electron spectroscopy
Chemical properties
Atomic force microscopy
Physical properties
Elastic moduli
Surface roughness
Plasmas
X ray diffraction
Sputtering
Spectroscopy

Keywords

  • deposition
  • magnetron reactive sputtering
  • titanium oxides and oxynitride

ASJC Scopus subject areas

  • Management of Technology and Innovation

Cite this

Morozova, N., Konishchev, M. E., Pustovalova, A. A., Bykova, Y., Grebneva, I., Kuzmin, O., & Pichugin, V. (2012). Titanium oxynitride thin films deposited by the reactive magnetron sputtering: Structure and physical-mechanical properties. In Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012 [6357769] https://doi.org/10.1109/IFOST.2012.6357769

Titanium oxynitride thin films deposited by the reactive magnetron sputtering : Structure and physical-mechanical properties. / Morozova, N.; Konishchev, Maxim Evgenievich; Pustovalova, Alla Alexandrovna; Bykova, Yu; Grebneva, I.; Kuzmin, O.; Pichugin, V.

Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012. 2012. 6357769.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Morozova, N, Konishchev, ME, Pustovalova, AA, Bykova, Y, Grebneva, I, Kuzmin, O & Pichugin, V 2012, Titanium oxynitride thin films deposited by the reactive magnetron sputtering: Structure and physical-mechanical properties. in Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012., 6357769, 2012 7th International Forum on Strategic Technology, IFOST 2012, Tomsk, Russian Federation, 18.9.12. https://doi.org/10.1109/IFOST.2012.6357769
Morozova N, Konishchev ME, Pustovalova AA, Bykova Y, Grebneva I, Kuzmin O et al. Titanium oxynitride thin films deposited by the reactive magnetron sputtering: Structure and physical-mechanical properties. In Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012. 2012. 6357769 https://doi.org/10.1109/IFOST.2012.6357769
Morozova, N. ; Konishchev, Maxim Evgenievich ; Pustovalova, Alla Alexandrovna ; Bykova, Yu ; Grebneva, I. ; Kuzmin, O. ; Pichugin, V. / Titanium oxynitride thin films deposited by the reactive magnetron sputtering : Structure and physical-mechanical properties. Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012. 2012.
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