Titanium oxynitride thin films deposited by the reactive magnetron sputtering: Structure and physical-mechanical properties

N. Morozova, Maxim Evgenievich Konishchev, Alla Alexandrovna Pustovalova, Yu Bykova, I. Grebneva, O. Kuzmin, V. Pichugin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

The physical-mechanical properties of titanium oxides and oxynitride films synthesized by pulsed magnetron reactive sputtering deposition technique were investigated. Optical emission spectroscopy was used to characterize magnetron plasma and determine an appropriate regime of films deposition. The structure and surface chemical and physical properties of the films were characterized by X-ray diffraction, Auger electron spectroscopy, atomic force microscopy (AFM). Mechanical characteristics of obtained films which include their roughness, nano-hardness (H) and Young's modulus (E) were studied.

Original languageEnglish
Title of host publicationProceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012
DOIs
Publication statusPublished - 2012
Event2012 7th International Forum on Strategic Technology, IFOST 2012 - Tomsk, Russian Federation
Duration: 18 Sep 201221 Sep 2012

Other

Other2012 7th International Forum on Strategic Technology, IFOST 2012
CountryRussian Federation
CityTomsk
Period18.9.1221.9.12

Keywords

  • deposition
  • magnetron reactive sputtering
  • titanium oxides and oxynitride

ASJC Scopus subject areas

  • Management of Technology and Innovation

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    Morozova, N., Konishchev, M. E., Pustovalova, A. A., Bykova, Y., Grebneva, I., Kuzmin, O., & Pichugin, V. (2012). Titanium oxynitride thin films deposited by the reactive magnetron sputtering: Structure and physical-mechanical properties. In Proceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012 [6357769] https://doi.org/10.1109/IFOST.2012.6357769