Titanium macroparticles density decreasing on the sample, immersed in plasma, at repetitively pulsed biasing

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Abstract

We have studied the features of the Ti macroparticles (MPs) accumulation on a substrate immersed in a DC vacuum arc plasma with a high frequency short pulse negative bias. The influence of several factors including processing time, the parameters of bias potential, and substrate characteristics was defined. It was found that the MP accumulation on a repetitively biased substrate was uneven over time. A deposition of MPs to substrate were significantly decreased after 1 min of processing at bias parameters f = 105 p.p.s., φb = -2 kV and τ = 7 μs. It was experimentally shown that DC vacuum arc plasma without pre-filtering of MPs can be used for high frequency short pulse plasma immersion metal ion implantation.

Original languageEnglish
Pages (from-to)126-129
Number of pages4
JournalApplied Surface Science
Volume310
DOIs
Publication statusPublished - 15 Aug 2014

Keywords

  • Macroparticles
  • Metal plasma
  • Negative high-frequency short-pulsed bias
  • Plasma immersion ion implantation
  • Vacuum-arc

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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