Time and thickness dependence of crystallization of amorphous magnetron deposited TiO 2 thin films

L. Nichtová, R. Kužel, Z. Matěj, J. Šícha, J. Musil

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Titanium dioxide films have many remarkable properties, for example photocatalytic activity and hydrophilicity. However, these properties depend significantly on the crystallinity, phase composition and microstructure of the films. In this study, crystallization of amorphous films with different thickness (50-2000 nm) deposited on silicon substrates was investigated by XRD in-situ isochronal and isothermal annealing at different temperatures and compared with the post-annealing of both amorphous and nanocrystalline films. It was found that the crystallization depends strongly on the film thickness, especially below about 500 nm and it is slow for very thin films. The process can be well described by the Avrami equation modified by the initial time of crystallization. The parameters of the equation depend on the film thickness.

Original languageEnglish
Pages (from-to)235-240
Number of pages6
JournalZeitschrift fur Kristallographie, Supplement
Issue number30
DOIs
Publication statusPublished - 1 Dec 2009

Fingerprint

Crystallization
time dependence
crystallization
Thin films
Film thickness
thin films
Isothermal annealing
film thickness
Hydrophilicity
Silicon
Amorphous films
Phase composition
Titanium dioxide
annealing
titanium oxides
Annealing
crystallinity
Microstructure
Substrates
microstructure

Keywords

  • Crystallization
  • In-situ measurements
  • Titanium dioxide

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Inorganic Chemistry

Cite this

Time and thickness dependence of crystallization of amorphous magnetron deposited TiO 2 thin films. / Nichtová, L.; Kužel, R.; Matěj, Z.; Šícha, J.; Musil, J.

In: Zeitschrift fur Kristallographie, Supplement, No. 30, 01.12.2009, p. 235-240.

Research output: Contribution to journalArticle

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