Thickness dependent wetting properties and surface free energy of HfO2 thin films

Sergei Zenkin, Alexandr Belosludtsev, Šimon Kos, Radomír Čerstvý, Stanislav Haviar, Marie Netrvalová

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

We show here that intrinsic hydrophobicity of HfO2 thin films can be easily tuned by the variation of film thickness. We used the reactive high-power impulse magnetron sputtering for preparation of high-quality HfO2 films with smooth topography and well-controlled thickness. Results show a strong dependence of wetting properties on the thickness of the film in the range of 50-250 nm due to the dominance of the electrostatic Lifshitz-van der Waals component of the surface free energy. We have found the water droplet contact angle ranging from ≈120° for the thickness of 50 nm to ≈100° for the thickness of 2300 nm. At the same time the surface free energy grows from ≈25 mJ/m2 for the thickness of 50 nm to ≈33 mJ/m2 for the thickness of 2300 nm. We propose two explanations for the observed thickness dependence of the wetting properties: influence of the non-dominant texture and/or non-monotonic size dependence of the particle surface energy.

Original languageEnglish
Article number231602
JournalApplied Physics Letters
Volume108
Issue number23
DOIs
Publication statusPublished - 6 Jun 2016
Externally publishedYes

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wetting
free energy
thin films
hydrophobicity
surface energy
impulses
magnetron sputtering
topography
film thickness
textures
electrostatics
preparation
water

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Zenkin, S., Belosludtsev, A., Kos, Š., Čerstvý, R., Haviar, S., & Netrvalová, M. (2016). Thickness dependent wetting properties and surface free energy of HfO2 thin films. Applied Physics Letters, 108(23), [231602]. https://doi.org/10.1063/1.4953262

Thickness dependent wetting properties and surface free energy of HfO2 thin films. / Zenkin, Sergei; Belosludtsev, Alexandr; Kos, Šimon; Čerstvý, Radomír; Haviar, Stanislav; Netrvalová, Marie.

In: Applied Physics Letters, Vol. 108, No. 23, 231602, 06.06.2016.

Research output: Contribution to journalArticle

Zenkin, S, Belosludtsev, A, Kos, Š, Čerstvý, R, Haviar, S & Netrvalová, M 2016, 'Thickness dependent wetting properties and surface free energy of HfO2 thin films', Applied Physics Letters, vol. 108, no. 23, 231602. https://doi.org/10.1063/1.4953262
Zenkin, Sergei ; Belosludtsev, Alexandr ; Kos, Šimon ; Čerstvý, Radomír ; Haviar, Stanislav ; Netrvalová, Marie. / Thickness dependent wetting properties and surface free energy of HfO2 thin films. In: Applied Physics Letters. 2016 ; Vol. 108, No. 23.
@article{954338bfd7bf49f793d9d231ae4fe244,
title = "Thickness dependent wetting properties and surface free energy of HfO2 thin films",
abstract = "We show here that intrinsic hydrophobicity of HfO2 thin films can be easily tuned by the variation of film thickness. We used the reactive high-power impulse magnetron sputtering for preparation of high-quality HfO2 films with smooth topography and well-controlled thickness. Results show a strong dependence of wetting properties on the thickness of the film in the range of 50-250 nm due to the dominance of the electrostatic Lifshitz-van der Waals component of the surface free energy. We have found the water droplet contact angle ranging from ≈120° for the thickness of 50 nm to ≈100° for the thickness of 2300 nm. At the same time the surface free energy grows from ≈25 mJ/m2 for the thickness of 50 nm to ≈33 mJ/m2 for the thickness of 2300 nm. We propose two explanations for the observed thickness dependence of the wetting properties: influence of the non-dominant texture and/or non-monotonic size dependence of the particle surface energy.",
author = "Sergei Zenkin and Alexandr Belosludtsev and Šimon Kos and Radom{\'i}r Čerstv{\'y} and Stanislav Haviar and Marie Netrvalov{\'a}",
year = "2016",
month = "6",
day = "6",
doi = "10.1063/1.4953262",
language = "English",
volume = "108",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "23",

}

TY - JOUR

T1 - Thickness dependent wetting properties and surface free energy of HfO2 thin films

AU - Zenkin, Sergei

AU - Belosludtsev, Alexandr

AU - Kos, Šimon

AU - Čerstvý, Radomír

AU - Haviar, Stanislav

AU - Netrvalová, Marie

PY - 2016/6/6

Y1 - 2016/6/6

N2 - We show here that intrinsic hydrophobicity of HfO2 thin films can be easily tuned by the variation of film thickness. We used the reactive high-power impulse magnetron sputtering for preparation of high-quality HfO2 films with smooth topography and well-controlled thickness. Results show a strong dependence of wetting properties on the thickness of the film in the range of 50-250 nm due to the dominance of the electrostatic Lifshitz-van der Waals component of the surface free energy. We have found the water droplet contact angle ranging from ≈120° for the thickness of 50 nm to ≈100° for the thickness of 2300 nm. At the same time the surface free energy grows from ≈25 mJ/m2 for the thickness of 50 nm to ≈33 mJ/m2 for the thickness of 2300 nm. We propose two explanations for the observed thickness dependence of the wetting properties: influence of the non-dominant texture and/or non-monotonic size dependence of the particle surface energy.

AB - We show here that intrinsic hydrophobicity of HfO2 thin films can be easily tuned by the variation of film thickness. We used the reactive high-power impulse magnetron sputtering for preparation of high-quality HfO2 films with smooth topography and well-controlled thickness. Results show a strong dependence of wetting properties on the thickness of the film in the range of 50-250 nm due to the dominance of the electrostatic Lifshitz-van der Waals component of the surface free energy. We have found the water droplet contact angle ranging from ≈120° for the thickness of 50 nm to ≈100° for the thickness of 2300 nm. At the same time the surface free energy grows from ≈25 mJ/m2 for the thickness of 50 nm to ≈33 mJ/m2 for the thickness of 2300 nm. We propose two explanations for the observed thickness dependence of the wetting properties: influence of the non-dominant texture and/or non-monotonic size dependence of the particle surface energy.

UR - http://www.scopus.com/inward/record.url?scp=84974529225&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84974529225&partnerID=8YFLogxK

U2 - 10.1063/1.4953262

DO - 10.1063/1.4953262

M3 - Article

VL - 108

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 23

M1 - 231602

ER -