Thickness dependent wetting properties and surface free energy of HfO2 thin films

Sergei Zenkin, Alexandr Belosludtsev, Šimon Kos, Radomír Čerstvý, Stanislav Haviar, Marie Netrvalová

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19 Citations (Scopus)

Abstract

We show here that intrinsic hydrophobicity of HfO2 thin films can be easily tuned by the variation of film thickness. We used the reactive high-power impulse magnetron sputtering for preparation of high-quality HfO2 films with smooth topography and well-controlled thickness. Results show a strong dependence of wetting properties on the thickness of the film in the range of 50-250 nm due to the dominance of the electrostatic Lifshitz-van der Waals component of the surface free energy. We have found the water droplet contact angle ranging from ≈120° for the thickness of 50 nm to ≈100° for the thickness of 2300 nm. At the same time the surface free energy grows from ≈25 mJ/m2 for the thickness of 50 nm to ≈33 mJ/m2 for the thickness of 2300 nm. We propose two explanations for the observed thickness dependence of the wetting properties: influence of the non-dominant texture and/or non-monotonic size dependence of the particle surface energy.

Original languageEnglish
Article number231602
JournalApplied Physics Letters
Volume108
Issue number23
DOIs
Publication statusPublished - 6 Jun 2016
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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    Zenkin, S., Belosludtsev, A., Kos, Š., Čerstvý, R., Haviar, S., & Netrvalová, M. (2016). Thickness dependent wetting properties and surface free energy of HfO2 thin films. Applied Physics Letters, 108(23), [231602]. https://doi.org/10.1063/1.4953262