Thermal stability and transformation phenomena in magnetron sputtered Al-Cu-O films

S. Zuzjaková, P. Zeman, J. Houška, R. Čerstvý, J. Musil

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


The present study focuses on the effect of Cu incorporation into magnetron sputtered alumina films. The transformation phenomena in an Al-O film and Al-Cu-O films with varying Cu content (1.4-9.6 at%) were studied using differential scanning calorimetry (DSC) and X-ray diffraction in combination with ab-initio calculations. In the Al-O film, only an exothermic transformation of an as-deposited γ-Al2O3 structure into α-Al2O3 is observed. In the Al-Cu-O films an exothermic decomposition of an as-deposited metastable solid solution into α-Al2O3 and CuAl2O4 was observed with a successive endothermic decomposition of CuAl2O4. In the Al-Cu-O film with 1.4 at% Cu the α-Al2O3 phase forms at a considerably lower temperature (∼1000 °C) compared to the Al-O film (∼1150 °C). The increasing Cu content results in an increase of thermal stability of the metastable solid solution and a decrease of (i) the concentration of octahedral Al vacancies and (ii) transformation energy of this solution upon heating.

Original languageEnglish
Pages (from-to)6020-6029
Number of pages10
JournalCeramics International
Issue number4
Publication statusPublished - 1 May 2015


  • Ab-initio calculations
  • Al-Cu-O films
  • Magnetron sputtering
  • Metastable solid solution
  • Phase transformations

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry

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