Thermal stability and oxidation resistance of ZrSiN nanocomposite and ZrN/SiNx multilayered coatings: A comparative study

I. A. Saladukhin, G. Abadias, V. V. Uglov, S. V. Zlotski, A. Michel, A. Janse van Vuuren

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

In the present work we comparatively study the thermal stability and oxidation resistance of ~ 300 nm thick Zr-Si-N coatings with either 2D or 3D interface geometry: 1) Zr-Si-N nanocomposites and 2) ZrN/SiNx nanoscale multilayers. Both types of films were prepared by reactive magnetron sputter-deposition on Si wafers under Ar + N2 plasma discharges. Zr-Si-N films were deposited by co-sputtering from Zr and Si targets at substrate temperature Tdep of 600 °C, with Si content ranging from 0 to 22.1 at.%, while ZrN/SiNx multilayers with ZrN (resp. SiNx) layer thickness varying from 2 to 40 nm (resp. 0.4 to 20 nm) were synthesized by sequential sputtering from elemental Zr and Si3N4 targets at Tdep = 300 °C. According to transmission electron microscopy (TEM) and X-ray diffraction (XRD) analysis the microstructure of Zr-Si-N films changes from dual-phase nanocomposite structure, consisting of ZrN nanograins (4–7 nm) surrounded by an amorphous tissue, towards X-ray amorphous with increasing Si content. The multilayered films consist of nanocrystalline (002)-oriented ZrN and amorphous SiNx layers. The structural evolution has been investigated by XRD after vacuum annealing at 1000 °C, while the oxidation resistance under air was studied using in situ XRD in the temperature range from 400 to 950 °C, as well as by scanning electron microscopy (SEM) and wavelength dispersive X-ray spectrometry (WDS) after air annealing procedure. While the reference ZrN film starts to oxidize at Tox. = 550 °C, a much higher oxidation resistance is found for multilayered films, till Tox. = 860–950 °C for ZrN/SiNx coatings with the elementary layer thickness ratio of 5 nm/10 nm, 3 nm/5 nm and 2 nm/5 nm. ZrSiN nanocomposites exhibit an improved oxidation resistance with increasing Si content compared to binary ZrN compound, but their stability is worst comparatively to the multilayers case.

Original languageEnglish
Pages (from-to)428-439
Number of pages12
JournalSurface and Coatings Technology
Volume332
DOIs
Publication statusPublished - 25 Dec 2017

Fingerprint

oxidation resistance
Oxidation resistance
Nanocomposites
nanocomposites
Thermodynamic stability
thermal stability
coatings
Coatings
Multilayers
Sputtering
x rays
sputtering
Wavelength dispersive spectroscopy
diffraction
Annealing
X ray diffraction
Sputter deposition
annealing
thickness ratio
air

Keywords

  • Hard coatings
  • Multilayer
  • Nanocomposite
  • Oxidation
  • Reactive magnetron sputter-deposition
  • Zr-Si-N

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Thermal stability and oxidation resistance of ZrSiN nanocomposite and ZrN/SiNx multilayered coatings : A comparative study. / Saladukhin, I. A.; Abadias, G.; Uglov, V. V.; Zlotski, S. V.; Michel, A.; Janse van Vuuren, A.

In: Surface and Coatings Technology, Vol. 332, 25.12.2017, p. 428-439.

Research output: Contribution to journalArticle

Saladukhin, I. A. ; Abadias, G. ; Uglov, V. V. ; Zlotski, S. V. ; Michel, A. ; Janse van Vuuren, A. / Thermal stability and oxidation resistance of ZrSiN nanocomposite and ZrN/SiNx multilayered coatings : A comparative study. In: Surface and Coatings Technology. 2017 ; Vol. 332. pp. 428-439.
@article{cd2ef74a1d8d4e1f9b7814dfe278cd6a,
title = "Thermal stability and oxidation resistance of ZrSiN nanocomposite and ZrN/SiNx multilayered coatings: A comparative study",
abstract = "In the present work we comparatively study the thermal stability and oxidation resistance of ~ 300 nm thick Zr-Si-N coatings with either 2D or 3D interface geometry: 1) Zr-Si-N nanocomposites and 2) ZrN/SiNx nanoscale multilayers. Both types of films were prepared by reactive magnetron sputter-deposition on Si wafers under Ar + N2 plasma discharges. Zr-Si-N films were deposited by co-sputtering from Zr and Si targets at substrate temperature Tdep of 600 °C, with Si content ranging from 0 to 22.1 at.{\%}, while ZrN/SiNx multilayers with ZrN (resp. SiNx) layer thickness varying from 2 to 40 nm (resp. 0.4 to 20 nm) were synthesized by sequential sputtering from elemental Zr and Si3N4 targets at Tdep = 300 °C. According to transmission electron microscopy (TEM) and X-ray diffraction (XRD) analysis the microstructure of Zr-Si-N films changes from dual-phase nanocomposite structure, consisting of ZrN nanograins (4–7 nm) surrounded by an amorphous tissue, towards X-ray amorphous with increasing Si content. The multilayered films consist of nanocrystalline (002)-oriented ZrN and amorphous SiNx layers. The structural evolution has been investigated by XRD after vacuum annealing at 1000 °C, while the oxidation resistance under air was studied using in situ XRD in the temperature range from 400 to 950 °C, as well as by scanning electron microscopy (SEM) and wavelength dispersive X-ray spectrometry (WDS) after air annealing procedure. While the reference ZrN film starts to oxidize at Tox. = 550 °C, a much higher oxidation resistance is found for multilayered films, till Tox. = 860–950 °C for ZrN/SiNx coatings with the elementary layer thickness ratio of 5 nm/10 nm, 3 nm/5 nm and 2 nm/5 nm. ZrSiN nanocomposites exhibit an improved oxidation resistance with increasing Si content compared to binary ZrN compound, but their stability is worst comparatively to the multilayers case.",
keywords = "Hard coatings, Multilayer, Nanocomposite, Oxidation, Reactive magnetron sputter-deposition, Zr-Si-N",
author = "Saladukhin, {I. A.} and G. Abadias and Uglov, {V. V.} and Zlotski, {S. V.} and A. Michel and {Janse van Vuuren}, A.",
year = "2017",
month = "12",
day = "25",
doi = "10.1016/j.surfcoat.2017.08.076",
language = "English",
volume = "332",
pages = "428--439",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",

}

TY - JOUR

T1 - Thermal stability and oxidation resistance of ZrSiN nanocomposite and ZrN/SiNx multilayered coatings

T2 - A comparative study

AU - Saladukhin, I. A.

AU - Abadias, G.

AU - Uglov, V. V.

AU - Zlotski, S. V.

AU - Michel, A.

AU - Janse van Vuuren, A.

PY - 2017/12/25

Y1 - 2017/12/25

N2 - In the present work we comparatively study the thermal stability and oxidation resistance of ~ 300 nm thick Zr-Si-N coatings with either 2D or 3D interface geometry: 1) Zr-Si-N nanocomposites and 2) ZrN/SiNx nanoscale multilayers. Both types of films were prepared by reactive magnetron sputter-deposition on Si wafers under Ar + N2 plasma discharges. Zr-Si-N films were deposited by co-sputtering from Zr and Si targets at substrate temperature Tdep of 600 °C, with Si content ranging from 0 to 22.1 at.%, while ZrN/SiNx multilayers with ZrN (resp. SiNx) layer thickness varying from 2 to 40 nm (resp. 0.4 to 20 nm) were synthesized by sequential sputtering from elemental Zr and Si3N4 targets at Tdep = 300 °C. According to transmission electron microscopy (TEM) and X-ray diffraction (XRD) analysis the microstructure of Zr-Si-N films changes from dual-phase nanocomposite structure, consisting of ZrN nanograins (4–7 nm) surrounded by an amorphous tissue, towards X-ray amorphous with increasing Si content. The multilayered films consist of nanocrystalline (002)-oriented ZrN and amorphous SiNx layers. The structural evolution has been investigated by XRD after vacuum annealing at 1000 °C, while the oxidation resistance under air was studied using in situ XRD in the temperature range from 400 to 950 °C, as well as by scanning electron microscopy (SEM) and wavelength dispersive X-ray spectrometry (WDS) after air annealing procedure. While the reference ZrN film starts to oxidize at Tox. = 550 °C, a much higher oxidation resistance is found for multilayered films, till Tox. = 860–950 °C for ZrN/SiNx coatings with the elementary layer thickness ratio of 5 nm/10 nm, 3 nm/5 nm and 2 nm/5 nm. ZrSiN nanocomposites exhibit an improved oxidation resistance with increasing Si content compared to binary ZrN compound, but their stability is worst comparatively to the multilayers case.

AB - In the present work we comparatively study the thermal stability and oxidation resistance of ~ 300 nm thick Zr-Si-N coatings with either 2D or 3D interface geometry: 1) Zr-Si-N nanocomposites and 2) ZrN/SiNx nanoscale multilayers. Both types of films were prepared by reactive magnetron sputter-deposition on Si wafers under Ar + N2 plasma discharges. Zr-Si-N films were deposited by co-sputtering from Zr and Si targets at substrate temperature Tdep of 600 °C, with Si content ranging from 0 to 22.1 at.%, while ZrN/SiNx multilayers with ZrN (resp. SiNx) layer thickness varying from 2 to 40 nm (resp. 0.4 to 20 nm) were synthesized by sequential sputtering from elemental Zr and Si3N4 targets at Tdep = 300 °C. According to transmission electron microscopy (TEM) and X-ray diffraction (XRD) analysis the microstructure of Zr-Si-N films changes from dual-phase nanocomposite structure, consisting of ZrN nanograins (4–7 nm) surrounded by an amorphous tissue, towards X-ray amorphous with increasing Si content. The multilayered films consist of nanocrystalline (002)-oriented ZrN and amorphous SiNx layers. The structural evolution has been investigated by XRD after vacuum annealing at 1000 °C, while the oxidation resistance under air was studied using in situ XRD in the temperature range from 400 to 950 °C, as well as by scanning electron microscopy (SEM) and wavelength dispersive X-ray spectrometry (WDS) after air annealing procedure. While the reference ZrN film starts to oxidize at Tox. = 550 °C, a much higher oxidation resistance is found for multilayered films, till Tox. = 860–950 °C for ZrN/SiNx coatings with the elementary layer thickness ratio of 5 nm/10 nm, 3 nm/5 nm and 2 nm/5 nm. ZrSiN nanocomposites exhibit an improved oxidation resistance with increasing Si content compared to binary ZrN compound, but their stability is worst comparatively to the multilayers case.

KW - Hard coatings

KW - Multilayer

KW - Nanocomposite

KW - Oxidation

KW - Reactive magnetron sputter-deposition

KW - Zr-Si-N

UR - http://www.scopus.com/inward/record.url?scp=85032013435&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85032013435&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2017.08.076

DO - 10.1016/j.surfcoat.2017.08.076

M3 - Article

AN - SCOPUS:85032013435

VL - 332

SP - 428

EP - 439

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

ER -