Abstract
In the present work we comparatively study the thermal stability and oxidation resistance of ~ 300 nm thick Zr-Si-N coatings with either 2D or 3D interface geometry: 1) Zr-Si-N nanocomposites and 2) ZrN/SiNx nanoscale multilayers. Both types of films were prepared by reactive magnetron sputter-deposition on Si wafers under Ar + N2 plasma discharges. Zr-Si-N films were deposited by co-sputtering from Zr and Si targets at substrate temperature Tdep of 600 °C, with Si content ranging from 0 to 22.1 at.%, while ZrN/SiNx multilayers with ZrN (resp. SiNx) layer thickness varying from 2 to 40 nm (resp. 0.4 to 20 nm) were synthesized by sequential sputtering from elemental Zr and Si3N4 targets at Tdep = 300 °C. According to transmission electron microscopy (TEM) and X-ray diffraction (XRD) analysis the microstructure of Zr-Si-N films changes from dual-phase nanocomposite structure, consisting of ZrN nanograins (4–7 nm) surrounded by an amorphous tissue, towards X-ray amorphous with increasing Si content. The multilayered films consist of nanocrystalline (002)-oriented ZrN and amorphous SiNx layers. The structural evolution has been investigated by XRD after vacuum annealing at 1000 °C, while the oxidation resistance under air was studied using in situ XRD in the temperature range from 400 to 950 °C, as well as by scanning electron microscopy (SEM) and wavelength dispersive X-ray spectrometry (WDS) after air annealing procedure. While the reference ZrN film starts to oxidize at Tox. = 550 °C, a much higher oxidation resistance is found for multilayered films, till Tox. = 860–950 °C for ZrN/SiNx coatings with the elementary layer thickness ratio of 5 nm/10 nm, 3 nm/5 nm and 2 nm/5 nm. ZrSiN nanocomposites exhibit an improved oxidation resistance with increasing Si content compared to binary ZrN compound, but their stability is worst comparatively to the multilayers case.
| Original language | English |
|---|---|
| Pages (from-to) | 428-439 |
| Number of pages | 12 |
| Journal | Surface and Coatings Technology |
| Volume | 332 |
| DOIs | |
| Publication status | Published - 25 Dec 2017 |
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Keywords
- Hard coatings
- Multilayer
- Nanocomposite
- Oxidation
- Reactive magnetron sputter-deposition
- Zr-Si-N
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry
Cite this
Thermal stability and oxidation resistance of ZrSiN nanocomposite and ZrN/SiNx multilayered coatings : A comparative study. / Saladukhin, I. A.; Abadias, G.; Uglov, V. V.; Zlotski, S. V.; Michel, A.; Janse van Vuuren, A.
In: Surface and Coatings Technology, Vol. 332, 25.12.2017, p. 428-439.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Thermal stability and oxidation resistance of ZrSiN nanocomposite and ZrN/SiNx multilayered coatings
T2 - A comparative study
AU - Saladukhin, I. A.
AU - Abadias, G.
AU - Uglov, V. V.
AU - Zlotski, S. V.
AU - Michel, A.
AU - Janse van Vuuren, A.
PY - 2017/12/25
Y1 - 2017/12/25
N2 - In the present work we comparatively study the thermal stability and oxidation resistance of ~ 300 nm thick Zr-Si-N coatings with either 2D or 3D interface geometry: 1) Zr-Si-N nanocomposites and 2) ZrN/SiNx nanoscale multilayers. Both types of films were prepared by reactive magnetron sputter-deposition on Si wafers under Ar + N2 plasma discharges. Zr-Si-N films were deposited by co-sputtering from Zr and Si targets at substrate temperature Tdep of 600 °C, with Si content ranging from 0 to 22.1 at.%, while ZrN/SiNx multilayers with ZrN (resp. SiNx) layer thickness varying from 2 to 40 nm (resp. 0.4 to 20 nm) were synthesized by sequential sputtering from elemental Zr and Si3N4 targets at Tdep = 300 °C. According to transmission electron microscopy (TEM) and X-ray diffraction (XRD) analysis the microstructure of Zr-Si-N films changes from dual-phase nanocomposite structure, consisting of ZrN nanograins (4–7 nm) surrounded by an amorphous tissue, towards X-ray amorphous with increasing Si content. The multilayered films consist of nanocrystalline (002)-oriented ZrN and amorphous SiNx layers. The structural evolution has been investigated by XRD after vacuum annealing at 1000 °C, while the oxidation resistance under air was studied using in situ XRD in the temperature range from 400 to 950 °C, as well as by scanning electron microscopy (SEM) and wavelength dispersive X-ray spectrometry (WDS) after air annealing procedure. While the reference ZrN film starts to oxidize at Tox. = 550 °C, a much higher oxidation resistance is found for multilayered films, till Tox. = 860–950 °C for ZrN/SiNx coatings with the elementary layer thickness ratio of 5 nm/10 nm, 3 nm/5 nm and 2 nm/5 nm. ZrSiN nanocomposites exhibit an improved oxidation resistance with increasing Si content compared to binary ZrN compound, but their stability is worst comparatively to the multilayers case.
AB - In the present work we comparatively study the thermal stability and oxidation resistance of ~ 300 nm thick Zr-Si-N coatings with either 2D or 3D interface geometry: 1) Zr-Si-N nanocomposites and 2) ZrN/SiNx nanoscale multilayers. Both types of films were prepared by reactive magnetron sputter-deposition on Si wafers under Ar + N2 plasma discharges. Zr-Si-N films were deposited by co-sputtering from Zr and Si targets at substrate temperature Tdep of 600 °C, with Si content ranging from 0 to 22.1 at.%, while ZrN/SiNx multilayers with ZrN (resp. SiNx) layer thickness varying from 2 to 40 nm (resp. 0.4 to 20 nm) were synthesized by sequential sputtering from elemental Zr and Si3N4 targets at Tdep = 300 °C. According to transmission electron microscopy (TEM) and X-ray diffraction (XRD) analysis the microstructure of Zr-Si-N films changes from dual-phase nanocomposite structure, consisting of ZrN nanograins (4–7 nm) surrounded by an amorphous tissue, towards X-ray amorphous with increasing Si content. The multilayered films consist of nanocrystalline (002)-oriented ZrN and amorphous SiNx layers. The structural evolution has been investigated by XRD after vacuum annealing at 1000 °C, while the oxidation resistance under air was studied using in situ XRD in the temperature range from 400 to 950 °C, as well as by scanning electron microscopy (SEM) and wavelength dispersive X-ray spectrometry (WDS) after air annealing procedure. While the reference ZrN film starts to oxidize at Tox. = 550 °C, a much higher oxidation resistance is found for multilayered films, till Tox. = 860–950 °C for ZrN/SiNx coatings with the elementary layer thickness ratio of 5 nm/10 nm, 3 nm/5 nm and 2 nm/5 nm. ZrSiN nanocomposites exhibit an improved oxidation resistance with increasing Si content compared to binary ZrN compound, but their stability is worst comparatively to the multilayers case.
KW - Hard coatings
KW - Multilayer
KW - Nanocomposite
KW - Oxidation
KW - Reactive magnetron sputter-deposition
KW - Zr-Si-N
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UR - http://www.scopus.com/inward/citedby.url?scp=85032013435&partnerID=8YFLogxK
U2 - 10.1016/j.surfcoat.2017.08.076
DO - 10.1016/j.surfcoat.2017.08.076
M3 - Article
VL - 332
SP - 428
EP - 439
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
SN - 0257-8972
ER -