Theoretical analysis of the mechanisms of influence of hydrogen additions on the emission parameters of a copper vapour laser

A. M. Boichenko, G. S. Evtushenko, O. V. Zhdaneev, S. I. Yakovlenko

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

A kinetic model of the active medium of a copper vapour laser with hydrogen additions is proposed. The model is tested using the available experimental data. Various points of view concerning the improvement of the emission parameters of the laser by adding hydrogen are analysed in detail. It is shown that the improvement of lasing parameters caused by the hydrogen addition is explained by different mechanisms. In the case of low pump-pulse repetition rates, the improvement is caused by an increase in the initial ground-state density of copper atoms and by quenching of the metastable states of copper atoms. When the pump-pulse repetition rate is high, the improvement is achieved due to a decrease in the prepulse electron concentration and temperature.

Original languageEnglish
Pages (from-to)1047-1058
Number of pages12
JournalQuantum Electronics
Volume33
Issue number12
DOIs
Publication statusPublished - Dec 2003

Fingerprint

Copper
Hydrogen
Pulse repetition rate
Vapors
vapors
copper
Lasers
pulse repetition rate
hydrogen
Pumps
lasers
Atoms
pumps
Ground state
Quenching
metastable state
atoms
lasing
Kinetics
Electrons

Keywords

  • Copper vapour laser
  • Hydrogen addition
  • Kinetic model

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)

Cite this

Theoretical analysis of the mechanisms of influence of hydrogen additions on the emission parameters of a copper vapour laser. / Boichenko, A. M.; Evtushenko, G. S.; Zhdaneev, O. V.; Yakovlenko, S. I.

In: Quantum Electronics, Vol. 33, No. 12, 12.2003, p. 1047-1058.

Research output: Contribution to journalArticle

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