Nitrogen-doped titanium dioxide (N-TiO2) nanofilms were deposited by reactive magnetron sputtering under different bias voltage. The mode of sputtering influences to formation and properties of titanium films. X-ray diffraction (XRD) was used to study the phase transition and crystallinity of the nanofilms. A technique of layer-by-layer measurement of Raman scattering from nanostructured titanium dioxide films based on a preliminary sputtering of the films by argon beam under an angle of 45° and less has been developed. Experimentally confirmed low dissolution rate of the coating in NaCl saline (0.9%).
|Journal||IOP Conference Series: Materials Science and Engineering|
|Publication status||Published - 27 Apr 2018|
|Event||3rd International Youth Scientific Forum with International Participation on New Materials - Moscow, Russian Federation|
Duration: 21 Nov 2017 → 24 Nov 2017
ASJC Scopus subject areas
- Materials Science(all)