Abstract
Nitrogen-doped titanium dioxide (N-TiO2) nanofilms were deposited by reactive magnetron sputtering under different bias voltage. The mode of sputtering influences to formation and properties of titanium films. X-ray diffraction (XRD) was used to study the phase transition and crystallinity of the nanofilms. A technique of layer-by-layer measurement of Raman scattering from nanostructured titanium dioxide films based on a preliminary sputtering of the films by argon beam under an angle of 45° and less has been developed. Experimentally confirmed low dissolution rate of the coating in NaCl saline (0.9%).
Original language | English |
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Article number | 012025 |
Journal | IOP Conference Series: Materials Science and Engineering |
Volume | 347 |
Issue number | 1 |
DOIs | |
Publication status | Published - 27 Apr 2018 |
Event | 3rd International Youth Scientific Forum with International Participation on New Materials - Moscow, Russian Federation Duration: 21 Nov 2017 → 24 Nov 2017 |
ASJC Scopus subject areas
- Materials Science(all)
- Engineering(all)