The reactive deposition of TiOx thin films

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

The article reports on the aspects of reactive deposition ultra-thin TiOx films (50 nm) by means of dual magnetron system with mirror and closed magnetic field (B field) configurations. The hysteresis effect of electrical discharge characteristics and oxygen partial pressure P(O2) are presented. The dual magnetron with closed B field configuration has less hysteresis peculiarities and transits back to metallic deposition mode at higher O2 flow rate (Q). The deposition rates don’t depend on B field configuration and correlate with changing of P(O2) and discharge voltage. The refractive spectra and energy of band gap, which are measured by UV-visible spectrophotometry and ellipsometry (λ=632.8 nm) methods, have strong dependence on Q(O2).

Original languageEnglish
Title of host publicationAdvanced Materials Research
PublisherTrans Tech Publications Ltd
Pages748-752
Number of pages5
Volume1040
ISBN (Print)9783038352648
DOIs
Publication statusPublished - 2014
EventInternational Conference for Young Scientists “High Technology: Research and Applications 2014”, HTRA 2014 - Tomsk, Russian Federation
Duration: 26 Mar 201428 Mar 2014

Publication series

NameAdvanced Materials Research
Volume1040
ISSN (Print)10226680
ISSN (Electronic)16628985

Other

OtherInternational Conference for Young Scientists “High Technology: Research and Applications 2014”, HTRA 2014
CountryRussian Federation
CityTomsk
Period26.3.1428.3.14

Fingerprint

Hysteresis
Thin films
Ultrathin films
Ellipsometry
Spectrophotometry
Deposition rates
Partial pressure
Mirrors
Energy gap
Flow rate
Magnetic fields
Oxygen
Electric potential

Keywords

  • Dual magnetron
  • Reactive sputtering
  • TiO thin films

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Sidelev, D. V., & Yurjev, Y. N. (2014). The reactive deposition of TiOx thin films. In Advanced Materials Research (Vol. 1040, pp. 748-752). (Advanced Materials Research; Vol. 1040). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/AMR.1040.748

The reactive deposition of TiOx thin films. / Sidelev, Dmitrii Vladimirovich; Yurjev, Yuriy N.

Advanced Materials Research. Vol. 1040 Trans Tech Publications Ltd, 2014. p. 748-752 (Advanced Materials Research; Vol. 1040).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Sidelev, DV & Yurjev, YN 2014, The reactive deposition of TiOx thin films. in Advanced Materials Research. vol. 1040, Advanced Materials Research, vol. 1040, Trans Tech Publications Ltd, pp. 748-752, International Conference for Young Scientists “High Technology: Research and Applications 2014”, HTRA 2014, Tomsk, Russian Federation, 26.3.14. https://doi.org/10.4028/www.scientific.net/AMR.1040.748
Sidelev DV, Yurjev YN. The reactive deposition of TiOx thin films. In Advanced Materials Research. Vol. 1040. Trans Tech Publications Ltd. 2014. p. 748-752. (Advanced Materials Research). https://doi.org/10.4028/www.scientific.net/AMR.1040.748
Sidelev, Dmitrii Vladimirovich ; Yurjev, Yuriy N. / The reactive deposition of TiOx thin films. Advanced Materials Research. Vol. 1040 Trans Tech Publications Ltd, 2014. pp. 748-752 (Advanced Materials Research).
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