Abstract
The article reports on the aspects of reactive deposition ultra-thin TiOx films (50 nm) by means of dual magnetron system with mirror and closed magnetic field (B field) configurations. The hysteresis effect of electrical discharge characteristics and oxygen partial pressure P(O2) are presented. The dual magnetron with closed B field configuration has less hysteresis peculiarities and transits back to metallic deposition mode at higher O2 flow rate (Q). The deposition rates don’t depend on B field configuration and correlate with changing of P(O2) and discharge voltage. The refractive spectra and energy of band gap, which are measured by UV-visible spectrophotometry and ellipsometry (λ=632.8 nm) methods, have strong dependence on Q(O2).
| Original language | English |
|---|---|
| Title of host publication | Advanced Materials Research |
| Publisher | Trans Tech Publications Ltd |
| Pages | 748-752 |
| Number of pages | 5 |
| Volume | 1040 |
| ISBN (Print) | 9783038352648 |
| DOIs | |
| Publication status | Published - 2014 |
| Event | International Conference for Young Scientists “High Technology: Research and Applications 2014”, HTRA 2014 - Tomsk, Russian Federation Duration: 26 Mar 2014 → 28 Mar 2014 |
Publication series
| Name | Advanced Materials Research |
|---|---|
| Volume | 1040 |
| ISSN (Print) | 10226680 |
| ISSN (Electronic) | 16628985 |
Other
| Other | International Conference for Young Scientists “High Technology: Research and Applications 2014”, HTRA 2014 |
|---|---|
| Country | Russian Federation |
| City | Tomsk |
| Period | 26.3.14 → 28.3.14 |
Fingerprint
Keywords
- Dual magnetron
- Reactive sputtering
- TiO thin films
ASJC Scopus subject areas
- Engineering(all)
Cite this
The reactive deposition of TiOx thin films. / Sidelev, Dmitrii Vladimirovich; Yurjev, Yuriy N.
Advanced Materials Research. Vol. 1040 Trans Tech Publications Ltd, 2014. p. 748-752 (Advanced Materials Research; Vol. 1040).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - The reactive deposition of TiOx thin films
AU - Sidelev, Dmitrii Vladimirovich
AU - Yurjev, Yuriy N.
PY - 2014
Y1 - 2014
N2 - The article reports on the aspects of reactive deposition ultra-thin TiOx films (50 nm) by means of dual magnetron system with mirror and closed magnetic field (B field) configurations. The hysteresis effect of electrical discharge characteristics and oxygen partial pressure P(O2) are presented. The dual magnetron with closed B field configuration has less hysteresis peculiarities and transits back to metallic deposition mode at higher O2 flow rate (Q). The deposition rates don’t depend on B field configuration and correlate with changing of P(O2) and discharge voltage. The refractive spectra and energy of band gap, which are measured by UV-visible spectrophotometry and ellipsometry (λ=632.8 nm) methods, have strong dependence on Q(O2).
AB - The article reports on the aspects of reactive deposition ultra-thin TiOx films (50 nm) by means of dual magnetron system with mirror and closed magnetic field (B field) configurations. The hysteresis effect of electrical discharge characteristics and oxygen partial pressure P(O2) are presented. The dual magnetron with closed B field configuration has less hysteresis peculiarities and transits back to metallic deposition mode at higher O2 flow rate (Q). The deposition rates don’t depend on B field configuration and correlate with changing of P(O2) and discharge voltage. The refractive spectra and energy of band gap, which are measured by UV-visible spectrophotometry and ellipsometry (λ=632.8 nm) methods, have strong dependence on Q(O2).
KW - Dual magnetron
KW - Reactive sputtering
KW - TiO thin films
UR - http://www.scopus.com/inward/record.url?scp=84913554599&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84913554599&partnerID=8YFLogxK
U2 - 10.4028/www.scientific.net/AMR.1040.748
DO - 10.4028/www.scientific.net/AMR.1040.748
M3 - Conference contribution
AN - SCOPUS:84913554599
SN - 9783038352648
VL - 1040
T3 - Advanced Materials Research
SP - 748
EP - 752
BT - Advanced Materials Research
PB - Trans Tech Publications Ltd
ER -