Abstract
This paper describes the deposition of the oxygen-deficient TiO2 films by the dual magnetron sputtering with different magnetic field configurations. The XRD survey and calculations of optical band gap demonstrate that the TiO2 films are polycrystalline with a mixture of anatase and rutile phases and have a low content of unbound Ti atoms. SEM and AFM investigations result in a columnar structure of the TiO2 films in the case of the mirror magnetic field configuration sputtering. For the closed configuration magnetic field, more intense ion bombardment of the growing films leads to the films densification. Optical and photocatalytic properties of the TiO2 films are strongly depended on the magnetic field configuration and determined by the films structure. The obtained results are interesting to modify the deposition technology of low-e coatings and solar materials.
| Original language | English |
|---|---|
| Pages (from-to) | 29-32 |
| Number of pages | 4 |
| Journal | Vacuum |
| Volume | 134 |
| DOIs | |
| Publication status | Published - 1 Dec 2016 |
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Keywords
- Dioxide titanium
- Dual magnetron sputtering
- Optical properties
- Photocatalytic activity
- Thin films
ASJC Scopus subject areas
- Instrumentation
- Condensed Matter Physics
- Surfaces, Coatings and Films
Cite this
The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering. / Sidelev, Dmitrii V.; Yurjev, Yury N.; Krivobokov, Valery Pavlovich; Erofeev, Evgenii V.; Penkova, Olga V.; Novikov, Vadim A.
In: Vacuum, Vol. 134, 01.12.2016, p. 29-32.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering
AU - Sidelev, Dmitrii V.
AU - Yurjev, Yury N.
AU - Krivobokov, Valery Pavlovich
AU - Erofeev, Evgenii V.
AU - Penkova, Olga V.
AU - Novikov, Vadim A.
PY - 2016/12/1
Y1 - 2016/12/1
N2 - This paper describes the deposition of the oxygen-deficient TiO2 films by the dual magnetron sputtering with different magnetic field configurations. The XRD survey and calculations of optical band gap demonstrate that the TiO2 films are polycrystalline with a mixture of anatase and rutile phases and have a low content of unbound Ti atoms. SEM and AFM investigations result in a columnar structure of the TiO2 films in the case of the mirror magnetic field configuration sputtering. For the closed configuration magnetic field, more intense ion bombardment of the growing films leads to the films densification. Optical and photocatalytic properties of the TiO2 films are strongly depended on the magnetic field configuration and determined by the films structure. The obtained results are interesting to modify the deposition technology of low-e coatings and solar materials.
AB - This paper describes the deposition of the oxygen-deficient TiO2 films by the dual magnetron sputtering with different magnetic field configurations. The XRD survey and calculations of optical band gap demonstrate that the TiO2 films are polycrystalline with a mixture of anatase and rutile phases and have a low content of unbound Ti atoms. SEM and AFM investigations result in a columnar structure of the TiO2 films in the case of the mirror magnetic field configuration sputtering. For the closed configuration magnetic field, more intense ion bombardment of the growing films leads to the films densification. Optical and photocatalytic properties of the TiO2 films are strongly depended on the magnetic field configuration and determined by the films structure. The obtained results are interesting to modify the deposition technology of low-e coatings and solar materials.
KW - Dioxide titanium
KW - Dual magnetron sputtering
KW - Optical properties
KW - Photocatalytic activity
KW - Thin films
UR - http://www.scopus.com/inward/record.url?scp=84988037006&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84988037006&partnerID=8YFLogxK
U2 - 10.1016/j.vacuum.2016.09.007
DO - 10.1016/j.vacuum.2016.09.007
M3 - Article
VL - 134
SP - 29
EP - 32
JO - Vacuum
JF - Vacuum
SN - 0042-207X
ER -