The results of experimental studies of the influence of the plasmodynamic deposition conditions of a copper coating on an aluminum contact surface on the contact resistance of an aluminum-copper high-current contact pair with a copper coating are presented. A significant decrease in contact resistance relative to an ordinary contact between aluminum and copper is observed as a result of optimization of the phase composition and structure of the transition layer.
- coaxial magnetoplasma accelerator
- contact pair
- contact resistance
ASJC Scopus subject areas
- Electrical and Electronic Engineering