The influence of repetitively pulsed plasma immersion low energy ion implantation on TiN coating formation and properties

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Application of high frequency short pulse plasma immersion low energy ion implantation for titanium nitride coating deposition using vacuum arc metal plasma and hot-cathode gas-discharge plasma on R6M5 alloy was investigated. Implementation of negative repetitively pulsed bias with bias amplitude 2 kV, pulse duration 5 μs and pulse frequency 105 Hz leads to 6.2-fold decrease of vacuum arc macroparticle surface density for macroparticles with diameter less than 0.5 μm. Ion sputtering due coating deposition reduces the production rate approximately by 30%. It was found that with bias amplitude range from 1.1 to 1.4 kV and pulse duration 5 μs yields to formation of coatings with local hardness up to 40 GPa. This paper presents the results of experimental studies of adhesion strength, tribological properties and surface morphology of deposited TiN coatings.

Original languageEnglish
Article number012103
JournalJournal of Physics: Conference Series
Issue number1
Publication statusPublished - 4 May 2017
Event5th International Congress on Energy Fluxes and Radiation Effects 2016, EFRE 2016 - Tomsk, Russian Federation
Duration: 2 Oct 20167 Oct 2016


ASJC Scopus subject areas

  • Physics and Astronomy(all)

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