Abstract
In the present study, the influence of Chromium nitride (CrN) and Titanium nitride (TiN) sublayers on the adhesion of polycrystalline diamond films applied to WC-Co substrates was investigated. CrN and TiN layers were deposited on WC-Co substrates by magnetron sputtering in Ar/N2 atmosphere. Synthesis of diamond films was conducted in an AC abnormal glow discharge CVD reactor. The phase composition of the films was characterized by small-angle X-ray diffraction (XRD). The adhesion of diamond films was compared by analysis of Rockwell indentation imprints. It was found that TiN does not react with the carbon of the diamond film while CrN almost completely converted into chromium carbide (Cr3C2). Adhesion tests showed that the efficiency of these sublayers usage is substantially lower than using a Murakami and HNO3/H2O pretreatment.
| Original language | English |
|---|---|
| Title of host publication | High Technology |
| Subtitle of host publication | Research and Applications, 2015 |
| Publisher | Trans Tech Publications Ltd |
| Pages | 583-586 |
| Number of pages | 4 |
| ISBN (Print) | 9783038357087 |
| DOIs | |
| Publication status | Published - 1 Jan 2016 |
| Event | 4th International Conference for Young Scientists High Technology: Research and Applications, HTRA 2015 - Tomsk, Russian Federation Duration: 21 Apr 2015 → 24 Apr 2015 |
Publication series
| Name | Key Engineering Materials |
|---|---|
| Volume | 685 |
| ISSN (Print) | 1013-9826 |
Conference
| Conference | 4th International Conference for Young Scientists High Technology: Research and Applications, HTRA 2015 |
|---|---|
| Country | Russian Federation |
| City | Tomsk |
| Period | 21.4.15 → 24.4.15 |
Fingerprint
Keywords
- Adhesion sublayer
- CVD diamond films
- Hard alloy
- Magnetron sputtering
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering
Cite this
The feasibility of usage TiN and CrN barrier sublayers for improving the adhesion of polycrystalline diamond films on WC-Co hard alloys. / Linnik, S. A.; Gaydaychuk, A. V.; Barishnikov, E. Y.
High Technology: Research and Applications, 2015. Trans Tech Publications Ltd, 2016. p. 583-586 (Key Engineering Materials; Vol. 685).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - The feasibility of usage TiN and CrN barrier sublayers for improving the adhesion of polycrystalline diamond films on WC-Co hard alloys
AU - Linnik, S. A.
AU - Gaydaychuk, A. V.
AU - Barishnikov, E. Y.
PY - 2016/1/1
Y1 - 2016/1/1
N2 - In the present study, the influence of Chromium nitride (CrN) and Titanium nitride (TiN) sublayers on the adhesion of polycrystalline diamond films applied to WC-Co substrates was investigated. CrN and TiN layers were deposited on WC-Co substrates by magnetron sputtering in Ar/N2 atmosphere. Synthesis of diamond films was conducted in an AC abnormal glow discharge CVD reactor. The phase composition of the films was characterized by small-angle X-ray diffraction (XRD). The adhesion of diamond films was compared by analysis of Rockwell indentation imprints. It was found that TiN does not react with the carbon of the diamond film while CrN almost completely converted into chromium carbide (Cr3C2). Adhesion tests showed that the efficiency of these sublayers usage is substantially lower than using a Murakami and HNO3/H2O pretreatment.
AB - In the present study, the influence of Chromium nitride (CrN) and Titanium nitride (TiN) sublayers on the adhesion of polycrystalline diamond films applied to WC-Co substrates was investigated. CrN and TiN layers were deposited on WC-Co substrates by magnetron sputtering in Ar/N2 atmosphere. Synthesis of diamond films was conducted in an AC abnormal glow discharge CVD reactor. The phase composition of the films was characterized by small-angle X-ray diffraction (XRD). The adhesion of diamond films was compared by analysis of Rockwell indentation imprints. It was found that TiN does not react with the carbon of the diamond film while CrN almost completely converted into chromium carbide (Cr3C2). Adhesion tests showed that the efficiency of these sublayers usage is substantially lower than using a Murakami and HNO3/H2O pretreatment.
KW - Adhesion sublayer
KW - CVD diamond films
KW - Hard alloy
KW - Magnetron sputtering
UR - http://www.scopus.com/inward/record.url?scp=84958211942&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84958211942&partnerID=8YFLogxK
U2 - 10.4028/www.scientific.net/KEM.685.583
DO - 10.4028/www.scientific.net/KEM.685.583
M3 - Conference contribution
SN - 9783038357087
T3 - Key Engineering Materials
SP - 583
EP - 586
BT - High Technology
PB - Trans Tech Publications Ltd
ER -