The effect of pulsed electron beam pretreatment of magnetron sputtered ZrO2:Y2O3 films on the performance of IT-SOFC

Y2O3 films on the performance of IT-SOFC

N. S. Sochugov, A. A. Soloviev, A. V. Shipilova, S. V. Rabotkin, V. P. Rotshtein, I. T. Sigfusson

Research output: Contribution to journalArticle

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Abstract

We describe a method of obtaining anode-supported ZrO2:Y 2O3 (YSZ) electrolyte films produced by reactive magnetron sputtering for intermediate temperature solid oxide fuel cell applications. A pulsed electron beam treatment was used as a method of preliminary modification of the porous structure in anode substrates. We studied the influence of this pretreatment on the gas tightness, structural and electrochemical properties of deposited films. It is shown that magnetron sputtering combined with a pulsed electron-beam treatment leads to the formation of dense and uniform YSZ films of 3-5 μm in thickness with a fine microstructure and improvement of electrochemical properties. Multifold increase in power density and a decrease in the YSZ electrolyte resistance compared to the samples produced only by magnetron sputtering were achieved. Single cells with sputtered YSZ electrolyte and LSM as active cathode materials were tested. 1.08 V open circuit voltage and a 310 mW cm- 2 maximum power density were achieved at 700 C by using humidified H2 as fuel and air as an oxidant.
Original languageEnglish
Pages (from-to)11-17
Number of pages7
JournalSolid State Ionics
Volume231
DOIs
Publication statusPublished - 1 Jan 2013

Fingerprint

yttria-stabilized zirconia
Solid oxide fuel cells (SOFC)
pretreatment
Magnetron sputtering
Electrolytes
Electron beams
electron beams
Electrochemical properties
magnetron sputtering
Anodes
electrolytes
radiant flux density
anodes
Reactive sputtering
Open circuit voltage
tightness
Oxidants
Structural properties
Cathodes
solid oxide fuel cells

Keywords

  • Magnetron sputtering
  • Pulsed electron-beam treatment
  • Scanning electron microscopy
  • Surface modification
  • Thin films
  • YSZ electrolyte

Cite this

The effect of pulsed electron beam pretreatment of magnetron sputtered ZrO2:Y2O3 films on the performance of IT-SOFC : Y2O3 films on the performance of IT-SOFC. / Sochugov, N. S.; Soloviev, A. A.; Shipilova, A. V.; Rabotkin, S. V.; Rotshtein, V. P.; Sigfusson, I. T.

In: Solid State Ionics, Vol. 231, 01.01.2013, p. 11-17.

Research output: Contribution to journalArticle

@article{efee03d81c1a4eff826f78a6481fdad4,
title = "The effect of pulsed electron beam pretreatment of magnetron sputtered ZrO2:Y2O3 films on the performance of IT-SOFC: Y2O3 films on the performance of IT-SOFC",
abstract = "We describe a method of obtaining anode-supported ZrO2:Y 2O3 (YSZ) electrolyte films produced by reactive magnetron sputtering for intermediate temperature solid oxide fuel cell applications. A pulsed electron beam treatment was used as a method of preliminary modification of the porous structure in anode substrates. We studied the influence of this pretreatment on the gas tightness, structural and electrochemical properties of deposited films. It is shown that magnetron sputtering combined with a pulsed electron-beam treatment leads to the formation of dense and uniform YSZ films of 3-5 μm in thickness with a fine microstructure and improvement of electrochemical properties. Multifold increase in power density and a decrease in the YSZ electrolyte resistance compared to the samples produced only by magnetron sputtering were achieved. Single cells with sputtered YSZ electrolyte and LSM as active cathode materials were tested. 1.08 V open circuit voltage and a 310 mW cm- 2 maximum power density were achieved at 700 C by using humidified H2 as fuel and air as an oxidant.",
keywords = "Magnetron sputtering, Pulsed electron-beam treatment, Scanning electron microscopy, Surface modification, Thin films, YSZ electrolyte",
author = "Sochugov, {N. S.} and Soloviev, {A. A.} and Shipilova, {A. V.} and Rabotkin, {S. V.} and Rotshtein, {V. P.} and Sigfusson, {I. T.}",
year = "2013",
month = "1",
day = "1",
doi = "10.1016/j.ssi.2012.11.001",
language = "English",
volume = "231",
pages = "11--17",
journal = "Solid State Ionics",
issn = "0167-2738",
publisher = "Elsevier",

}

TY - JOUR

T1 - The effect of pulsed electron beam pretreatment of magnetron sputtered ZrO2:Y2O3 films on the performance of IT-SOFC

T2 - Y2O3 films on the performance of IT-SOFC

AU - Sochugov, N. S.

AU - Soloviev, A. A.

AU - Shipilova, A. V.

AU - Rabotkin, S. V.

AU - Rotshtein, V. P.

AU - Sigfusson, I. T.

PY - 2013/1/1

Y1 - 2013/1/1

N2 - We describe a method of obtaining anode-supported ZrO2:Y 2O3 (YSZ) electrolyte films produced by reactive magnetron sputtering for intermediate temperature solid oxide fuel cell applications. A pulsed electron beam treatment was used as a method of preliminary modification of the porous structure in anode substrates. We studied the influence of this pretreatment on the gas tightness, structural and electrochemical properties of deposited films. It is shown that magnetron sputtering combined with a pulsed electron-beam treatment leads to the formation of dense and uniform YSZ films of 3-5 μm in thickness with a fine microstructure and improvement of electrochemical properties. Multifold increase in power density and a decrease in the YSZ electrolyte resistance compared to the samples produced only by magnetron sputtering were achieved. Single cells with sputtered YSZ electrolyte and LSM as active cathode materials were tested. 1.08 V open circuit voltage and a 310 mW cm- 2 maximum power density were achieved at 700 C by using humidified H2 as fuel and air as an oxidant.

AB - We describe a method of obtaining anode-supported ZrO2:Y 2O3 (YSZ) electrolyte films produced by reactive magnetron sputtering for intermediate temperature solid oxide fuel cell applications. A pulsed electron beam treatment was used as a method of preliminary modification of the porous structure in anode substrates. We studied the influence of this pretreatment on the gas tightness, structural and electrochemical properties of deposited films. It is shown that magnetron sputtering combined with a pulsed electron-beam treatment leads to the formation of dense and uniform YSZ films of 3-5 μm in thickness with a fine microstructure and improvement of electrochemical properties. Multifold increase in power density and a decrease in the YSZ electrolyte resistance compared to the samples produced only by magnetron sputtering were achieved. Single cells with sputtered YSZ electrolyte and LSM as active cathode materials were tested. 1.08 V open circuit voltage and a 310 mW cm- 2 maximum power density were achieved at 700 C by using humidified H2 as fuel and air as an oxidant.

KW - Magnetron sputtering

KW - Pulsed electron-beam treatment

KW - Scanning electron microscopy

KW - Surface modification

KW - Thin films

KW - YSZ electrolyte

UR - http://www.scopus.com/inward/record.url?scp=84869873601&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84869873601&partnerID=8YFLogxK

U2 - 10.1016/j.ssi.2012.11.001

DO - 10.1016/j.ssi.2012.11.001

M3 - Article

VL - 231

SP - 11

EP - 17

JO - Solid State Ionics

JF - Solid State Ionics

SN - 0167-2738

ER -