Abstract
The paper reports on the structure, mechanical and optical properties of sputtered Zr-Al-O films. The Zr-Al-O films with Zr/Al>1 and Zr/Al<1 were prepared by a reactive sputtering using ac pulse dual magnetrons. The magnetrons were equipped with a target composed of Al plate (θ=50mm) fixed to the magnetron cathode by a Zr fixing ring with inner diameter θ in . The content of Al in the Zr-Al-O film was controlled by θ in . It makes possible to control effectively the structure of the Zr-Al-O film determined by a mixture of the crystalline ZrO 2 phase and the amorphous Al 2 O 3 phase. The effect of Al content on the structure, mechanical and optical properties of the Zr-Al-O film is investigated in detail. It was found that (i) the Zr-Al-O films with Zr/Al<1 are X-ray amorphous and exhibit low hardness (H≤13GPa), an effective Young's modulus E * resulting in a low H/E * <0.1 ratio and low elastic recovery W e ≤60 and (ii) the Zr-Al-O films with Zr/Al>1 are crystalline and exhibit high hardness (H=18 to 19GPa), an E * satisfying a high H/E * ≥0.1 ratio, high W e up to 78% and strongly enhanced resistance to cracking during bending even for thick films up to 5μm.
Original language | English |
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Pages (from-to) | 355-360 |
Number of pages | 6 |
Journal | Surface and Coatings Technology |
Volume | 207 |
DOIs | |
Publication status | Published - 25 Aug 2012 |
Keywords
- Mechanical properties
- Optical properties
- Reactive magnetron sputtering
- Resistance to cracking
- Structure
- Zr-Al-O film
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry