The effect of addition of Al in ZrO 2 thin film on its resistance to cracking

J. Musil, J. Sklenka, R. Čerstvý, T. Suzuki, T. Mori, M. Takahashi

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

The paper reports on the structure, mechanical and optical properties of sputtered Zr-Al-O films. The Zr-Al-O films with Zr/Al>1 and Zr/Al<1 were prepared by a reactive sputtering using ac pulse dual magnetrons. The magnetrons were equipped with a target composed of Al plate (θ=50mm) fixed to the magnetron cathode by a Zr fixing ring with inner diameter θ in . The content of Al in the Zr-Al-O film was controlled by θ in . It makes possible to control effectively the structure of the Zr-Al-O film determined by a mixture of the crystalline ZrO 2 phase and the amorphous Al 2 O 3 phase. The effect of Al content on the structure, mechanical and optical properties of the Zr-Al-O film is investigated in detail. It was found that (i) the Zr-Al-O films with Zr/Al<1 are X-ray amorphous and exhibit low hardness (H≤13GPa), an effective Young's modulus E * resulting in a low H/E * <0.1 ratio and low elastic recovery W e ≤60 and (ii) the Zr-Al-O films with Zr/Al>1 are crystalline and exhibit high hardness (H=18 to 19GPa), an E * satisfying a high H/E * ≥0.1 ratio, high W e up to 78% and strongly enhanced resistance to cracking during bending even for thick films up to 5μm.

Original languageEnglish
Pages (from-to)355-360
Number of pages6
JournalSurface and Coatings Technology
Volume207
DOIs
Publication statusPublished - 25 Aug 2012

Keywords

  • Mechanical properties
  • Optical properties
  • Reactive magnetron sputtering
  • Resistance to cracking
  • Structure
  • Zr-Al-O film

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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