The dynamic sublayers for improving the adhesion of CVD diamond films on copper

Abstract

Polycrystalline diamond films were fabricated on copper substrates by a multi-step process comprised of physical vapor deposition of Al-based composite interlayer on Cu substrate and depositing continuous diamond film on composite interlayer by plasma assisted chemical vapor deposition (PACVD). The interface characteristics and adhesion strength were investigated by Auger electron spectroscopy, Raman analysis, calotest and indentation test. The results show that the continuous film without cracks is successfully obtained. The improved adhesion between diamond film and substrate results from the low residual stress in the film due to their compensation by Al interlayer in the sample cooling process.

Original language	English
Article number	012102
Journal	Journal of Physics: Conference Series
Volume	830
Issue number	1
DOIs	https://doi.org/10.1088/1742-6596/830/1/012102
Publication status	Published - 4 May 2017

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1088/1742-6596/830/1/012102

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title = "The dynamic sublayers for improving the adhesion of CVD diamond films on copper",

abstract = "Polycrystalline diamond films were fabricated on copper substrates by a multi-step process comprised of physical vapor deposition of Al-based composite interlayer on Cu substrate and depositing continuous diamond film on composite interlayer by plasma assisted chemical vapor deposition (PACVD). The interface characteristics and adhesion strength were investigated by Auger electron spectroscopy, Raman analysis, calotest and indentation test. The results show that the continuous film without cracks is successfully obtained. The improved adhesion between diamond film and substrate results from the low residual stress in the film due to their compensation by Al interlayer in the sample cooling process.",

author = "Gaydaychuk, {A. V.} and Linnik, {S. A.} and Okhotnikov, {V. V.}",

year = "2017",

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doi = "10.1088/1742-6596/830/1/012102",

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AU - Gaydaychuk, A. V.

AU - Linnik, S. A.

AU - Okhotnikov, V. V.

PY - 2017/5/4

Y1 - 2017/5/4

N2 - Polycrystalline diamond films were fabricated on copper substrates by a multi-step process comprised of physical vapor deposition of Al-based composite interlayer on Cu substrate and depositing continuous diamond film on composite interlayer by plasma assisted chemical vapor deposition (PACVD). The interface characteristics and adhesion strength were investigated by Auger electron spectroscopy, Raman analysis, calotest and indentation test. The results show that the continuous film without cracks is successfully obtained. The improved adhesion between diamond film and substrate results from the low residual stress in the film due to their compensation by Al interlayer in the sample cooling process.

AB - Polycrystalline diamond films were fabricated on copper substrates by a multi-step process comprised of physical vapor deposition of Al-based composite interlayer on Cu substrate and depositing continuous diamond film on composite interlayer by plasma assisted chemical vapor deposition (PACVD). The interface characteristics and adhesion strength were investigated by Auger electron spectroscopy, Raman analysis, calotest and indentation test. The results show that the continuous film without cracks is successfully obtained. The improved adhesion between diamond film and substrate results from the low residual stress in the film due to their compensation by Al interlayer in the sample cooling process.

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The dynamic sublayers for improving the adhesion of CVD diamond films on copper

Abstract

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