The accumulation of radiation defects in callium arsenide that has been subjected to pulsed and continuous ion implantation

Abstract

Measurements of electrical conductivity and Rutherford backscattering are used to study the accumulation of defects in GaAs that has been subjected to pulsed (τp = 1.3 × 10(-2) s and an off-duty factor of 100) and continuous irradiation with ³²S, ¹²C, and ⁴He ions at room temperature at the ion energies E = 100-150 keV, doses Φ = 1 × 10⁹-6 × 10^-6 cm(-2), and current densities j = 1 × 10(-9)-3 × 10(-6) A cm(-2). It is shown that the defect-accumulation rate during the pulsed implantation is much lower than it is during the continuous implantation.

Original language	English
Pages (from-to)	293-295
Number of pages	3
Journal	Semiconductors
Volume	39
Issue number	3
DOIs	https://doi.org/10.1134/1.1882789
Publication status	Published - 1 Jan 2005

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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10.1134/1.1882789

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@article{fda18fb5e0e54ab0b444ea020c81bcbe,

title = "The accumulation of radiation defects in callium arsenide that has been subjected to pulsed and continuous ion implantation",

abstract = "Measurements of electrical conductivity and Rutherford backscattering are used to study the accumulation of defects in GaAs that has been subjected to pulsed (τp = 1.3 × 10(-2) s and an off-duty factor of 100) and continuous irradiation with 32S, 12C, and 4He ions at room temperature at the ion energies E = 100-150 keV, doses Φ = 1 × 109-6 × 10-6 cm(-2), and current densities j = 1 × 10(-9)-3 × 10(-6) A cm(-2). It is shown that the defect-accumulation rate during the pulsed implantation is much lower than it is during the continuous implantation.",

author = "Ardyshev, {M. V.} and Ardyshev, {V. M.} and Kryuchkov, {Yu Yu}",

year = "2005",

month = jan,

day = "1",

doi = "10.1134/1.1882789",

language = "English",

volume = "39",

pages = "293--295",

journal = "Semiconductors",

issn = "1063-7826",

publisher = "Maik Nauka-Interperiodica Publishing",

number = "3",

}

TY - JOUR

T1 - The accumulation of radiation defects in callium arsenide that has been subjected to pulsed and continuous ion implantation

AU - Ardyshev, M. V.

AU - Ardyshev, V. M.

AU - Kryuchkov, Yu Yu

PY - 2005/1/1

Y1 - 2005/1/1

N2 - Measurements of electrical conductivity and Rutherford backscattering are used to study the accumulation of defects in GaAs that has been subjected to pulsed (τp = 1.3 × 10(-2) s and an off-duty factor of 100) and continuous irradiation with 32S, 12C, and 4He ions at room temperature at the ion energies E = 100-150 keV, doses Φ = 1 × 109-6 × 10-6 cm(-2), and current densities j = 1 × 10(-9)-3 × 10(-6) A cm(-2). It is shown that the defect-accumulation rate during the pulsed implantation is much lower than it is during the continuous implantation.

AB - Measurements of electrical conductivity and Rutherford backscattering are used to study the accumulation of defects in GaAs that has been subjected to pulsed (τp = 1.3 × 10(-2) s and an off-duty factor of 100) and continuous irradiation with 32S, 12C, and 4He ions at room temperature at the ion energies E = 100-150 keV, doses Φ = 1 × 109-6 × 10-6 cm(-2), and current densities j = 1 × 10(-9)-3 × 10(-6) A cm(-2). It is shown that the defect-accumulation rate during the pulsed implantation is much lower than it is during the continuous implantation.

UR - http://www.scopus.com/inward/record.url?scp=17644378056&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=17644378056&partnerID=8YFLogxK

U2 - 10.1134/1.1882789

DO - 10.1134/1.1882789

M3 - Article

AN - SCOPUS:17644378056

VL - 39

SP - 293

EP - 295

JO - Semiconductors

JF - Semiconductors

SN - 1063-7826

IS - 3

ER -