Surface erosion of hot Cr target and deposition rates of Cr coatings in high power pulsed magnetron sputtering

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4 Citations (Scopus)

Abstract

High power pulsed magnetron sputtering (HPPMS) of a hot chromium target by using a combined power source is the aim the present research. The combination of HPPMS technique and hot target can be effective way to produce Cr coatings. The investigations were performed by using a power supply with pulse frequency of 500 Hz, duty cycle of 4% in the range of power density averaged over pulse period from 15 to 65 W/cm2. The specific feature of the investigation is that sputtering and sublimation of the target occur simultaneously. The experimental results and the calculations revealed the important role of sublimated Cr atoms concentration near the target in increasing the pulsed and average discharge current and in setting up the self-sputtering mode. The erosion yield of the hot Cr target is determined, and in the investigated power range, it increases from 1.5 to 30 atoms per ion due to sublimation. As a result, the coating deposition rate by HPPMS from hot solid target can be increased 10–30 times in comparison to cooled target sputtering.

Original languageEnglish
Pages (from-to)161-168
Number of pages8
JournalSurface and Coatings Technology
Volume354
DOIs
Publication statusPublished - 25 Nov 2018

Fingerprint

Deposition rates
Magnetron sputtering
erosion
Sputtering
Erosion
magnetron sputtering
Sublimation
coatings
Coatings
Atoms
Chromium
sputtering
sublimation
Ions
atom concentration
pulses
power supplies
radiant flux density
chromium
cycles

Keywords

  • Cr coatings
  • Evaporation and sublimation
  • High power pulsed magnetron sputtering (HPPMS)
  • Hot target

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

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title = "Surface erosion of hot Cr target and deposition rates of Cr coatings in high power pulsed magnetron sputtering",
abstract = "High power pulsed magnetron sputtering (HPPMS) of a hot chromium target by using a combined power source is the aim the present research. The combination of HPPMS technique and hot target can be effective way to produce Cr coatings. The investigations were performed by using a power supply with pulse frequency of 500 Hz, duty cycle of 4{\%} in the range of power density averaged over pulse period from 15 to 65 W/cm2. The specific feature of the investigation is that sputtering and sublimation of the target occur simultaneously. The experimental results and the calculations revealed the important role of sublimated Cr atoms concentration near the target in increasing the pulsed and average discharge current and in setting up the self-sputtering mode. The erosion yield of the hot Cr target is determined, and in the investigated power range, it increases from 1.5 to 30 atoms per ion due to sublimation. As a result, the coating deposition rate by HPPMS from hot solid target can be increased 10–30 times in comparison to cooled target sputtering.",
keywords = "Cr coatings, Evaporation and sublimation, High power pulsed magnetron sputtering (HPPMS), Hot target",
author = "Bleykher, {G. A.} and Sidelev, {D. V.} and Grudinin, {V. A.} and Krivobokov, {V. P.} and M. Bestetti",
year = "2018",
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journal = "Surface and Coatings Technology",
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T1 - Surface erosion of hot Cr target and deposition rates of Cr coatings in high power pulsed magnetron sputtering

AU - Bleykher, G. A.

AU - Sidelev, D. V.

AU - Grudinin, V. A.

AU - Krivobokov, V. P.

AU - Bestetti, M.

PY - 2018/11/25

Y1 - 2018/11/25

N2 - High power pulsed magnetron sputtering (HPPMS) of a hot chromium target by using a combined power source is the aim the present research. The combination of HPPMS technique and hot target can be effective way to produce Cr coatings. The investigations were performed by using a power supply with pulse frequency of 500 Hz, duty cycle of 4% in the range of power density averaged over pulse period from 15 to 65 W/cm2. The specific feature of the investigation is that sputtering and sublimation of the target occur simultaneously. The experimental results and the calculations revealed the important role of sublimated Cr atoms concentration near the target in increasing the pulsed and average discharge current and in setting up the self-sputtering mode. The erosion yield of the hot Cr target is determined, and in the investigated power range, it increases from 1.5 to 30 atoms per ion due to sublimation. As a result, the coating deposition rate by HPPMS from hot solid target can be increased 10–30 times in comparison to cooled target sputtering.

AB - High power pulsed magnetron sputtering (HPPMS) of a hot chromium target by using a combined power source is the aim the present research. The combination of HPPMS technique and hot target can be effective way to produce Cr coatings. The investigations were performed by using a power supply with pulse frequency of 500 Hz, duty cycle of 4% in the range of power density averaged over pulse period from 15 to 65 W/cm2. The specific feature of the investigation is that sputtering and sublimation of the target occur simultaneously. The experimental results and the calculations revealed the important role of sublimated Cr atoms concentration near the target in increasing the pulsed and average discharge current and in setting up the self-sputtering mode. The erosion yield of the hot Cr target is determined, and in the investigated power range, it increases from 1.5 to 30 atoms per ion due to sublimation. As a result, the coating deposition rate by HPPMS from hot solid target can be increased 10–30 times in comparison to cooled target sputtering.

KW - Cr coatings

KW - Evaporation and sublimation

KW - High power pulsed magnetron sputtering (HPPMS)

KW - Hot target

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