Surface chemistry of plasma deposited ZrC hard coatings

M. Balaceanu, M. Braic, V. Braic, A. Vladescu, C. C. Negrila

Research output: Contribution to journalArticlepeer-review

30 Citations (Scopus)

Abstract

X-ray Photoelectron Spectroscopy (XPS) was used to investigate the chemical state of ZrC coatings deposited by cathodic arc method. A chemistry model of the ZrC films has been proposed. It was pointed out that on the films surface a highly oxidized passive layer, containing also carbon and oxygen as contaminants, was formed. The film bulk was composed by a mixture of ZrC (the dominant phase), ZrO2 and free carbon.

Original languageEnglish
Pages (from-to)2557-2560
Number of pages4
JournalJournal of Optoelectronics and Advanced Materials
Volume7
Issue number5
Publication statusPublished - 1 Oct 2005
Externally publishedYes

Keywords

  • Cathodic arc deposition
  • Chemical composition
  • XPS
  • ZrC coatings

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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