Abstract
The cross section of a Si surface layer implanted with <sup>64</sup>Zn<sup>+</sup> and <sup>16</sup>O<sup>+</sup> ions is visualized via high-resolution transmission electron microscopy, and its evolution as a result of thermal annealing is investigated. The profiles of impurities implanted into this layer, which are measured by means of secondary-ion mass spectrometry, as well as their changes arising from heat treatment, are analyzed. The surface morphology is examined with the help of atomic-force microscopy.
Original language | English |
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Pages (from-to) | 486-495 |
Number of pages | 10 |
Journal | Journal of Surface Investigation |
Volume | 9 |
Issue number | 3 |
DOIs | |
Publication status | Published - 8 May 2015 |
Keywords
- ion implantation
- nanoparticles
- silicon
- zinc
- zinc oxide
ASJC Scopus subject areas
- Surfaces, Coatings and Films