Study of the properties of a Si surface layer implanted with <sup>64</sup>Zn<sup>+</sup> and <sup>16</sup>O<sup>+</sup> ions during the formation of ZnO nanoparticles under thermal annealing

V. V. Privezentsev, V. S. Kulikauskas, V. V. Zatekin, D. V. Petrov, A. Yu Trifonov, A. A. Batrakov

Research output: Contribution to journalArticle

Abstract

The cross section of a Si surface layer implanted with <sup>64</sup>Zn<sup>+</sup> and <sup>16</sup>O<sup>+</sup> ions is visualized via high-resolution transmission electron microscopy, and its evolution as a result of thermal annealing is investigated. The profiles of impurities implanted into this layer, which are measured by means of secondary-ion mass spectrometry, as well as their changes arising from heat treatment, are analyzed. The surface morphology is examined with the help of atomic-force microscopy.

Original languageEnglish
Pages (from-to)486-495
Number of pages10
JournalJournal of Surface Investigation
Volume9
Issue number3
DOIs
Publication statusPublished - 8 May 2015

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Keywords

  • ion implantation
  • nanoparticles
  • silicon
  • zinc
  • zinc oxide

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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