Abstract
The cross section of a Si surface layer implanted with <sup>64</sup>Zn<sup>+</sup> and <sup>16</sup>O<sup>+</sup> ions is visualized via high-resolution transmission electron microscopy, and its evolution as a result of thermal annealing is investigated. The profiles of impurities implanted into this layer, which are measured by means of secondary-ion mass spectrometry, as well as their changes arising from heat treatment, are analyzed. The surface morphology is examined with the help of atomic-force microscopy.
| Original language | English |
|---|---|
| Pages (from-to) | 486-495 |
| Number of pages | 10 |
| Journal | Journal of Surface Investigation |
| Volume | 9 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 8 May 2015 |
Keywords
- ion implantation
- nanoparticles
- silicon
- zinc
- zinc oxide
ASJC Scopus subject areas
- Surfaces, Coatings and Films
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Cite this
Privezentsev, V. V., Kulikauskas, V. S., Zatekin, V. V., Petrov, D. V., Trifonov, A. Y., & Batrakov, A. A. (2015). Study of the properties of a Si surface layer implanted with <sup>64</sup>Zn<sup>+</sup> and <sup>16</sup>O<sup>+</sup> ions during the formation of ZnO nanoparticles under thermal annealing. Journal of Surface Investigation, 9(3), 486-495. https://doi.org/10.1134/S1027451015020160