Study of crystallization of magnetron sputtered TiO2 thin films by X-ray scattering

R. Kužel, L. Nichtová, Z. Matěj, D. Heřman, J. Šícha, J. Musil

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)


Crystallization of a set of magnetron deposited TiO2 thin films with different thickness in the range of 54 - 2000 nm has been studied by X-ray scattering. Phase analysis, lattice parameters and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. As-deposited films were amorphous. They were annealed at different temperatures and found to be crystalline after annealing at 250°C except the thinnest films which crystallized at higher temperatures.

Original languageEnglish
Pages (from-to)247-252
Number of pages6
JournalZeitschrift fur Kristallographie, Supplement
Issue number26
Publication statusPublished - 1 Dec 2007


  • Crystallization
  • Thin films
  • Titanium oxide
  • X-ray diffraction

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Inorganic Chemistry

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