Structure, mechanical and optical properties of silicon-rich Al-Si-N films prepared by high power impulse magnetron sputtering

Sergei Zenkin, Fedor Konusov, Aleksandr Lauk, Denis Zelentsov, Stanislav Demchenko

Research output: Contribution to journalArticle

Abstract

This article reports on the influence of the sputtering parameters (discharge voltage, average target power density) of a high power impulse magnetron discharge (HiPIMS) on the structure, mechanical and optical properties of silicon-rich Al-Si-N films. We show that with the change of a discharge target power density in the range of 30-120 W/cm2, the hardness of the sputtered Al-Si-N films nonlinearly changes in the range of 22-29 GPa, while the concentration of the absorption centers changes in the range of 1018-1020/cm3. The optical spectra of the HiPIMS sputtered films are completely different from the Al-Si-N films prepared by a direct current magnetron sputtering, with an absence of "monoenergetic" optical absorption centers, which are attributed to point defects.

Original languageEnglish
Article number53
JournalCoatings
Volume9
Issue number1
DOIs
Publication statusPublished - 17 Jan 2019

Fingerprint

Silicon
Magnetron sputtering
impulses
magnetron sputtering
Optical properties
mechanical properties
optical properties
Mechanical properties
silicon
radiant flux density
Point defects
Light absorption
point defects
Sputtering
optical spectrum
optical absorption
hardness
sputtering
direct current
Hardness

Keywords

  • Al-Si-N
  • HiPIMS
  • Microstructure
  • Silicon nitride

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Materials Chemistry
  • Surfaces and Interfaces

Cite this

Structure, mechanical and optical properties of silicon-rich Al-Si-N films prepared by high power impulse magnetron sputtering. / Zenkin, Sergei; Konusov, Fedor; Lauk, Aleksandr; Zelentsov, Denis; Demchenko, Stanislav.

In: Coatings, Vol. 9, No. 1, 53, 17.01.2019.

Research output: Contribution to journalArticle

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