Structure, mechanical and optical properties of silicon-rich Al-Si-N films prepared by high power impulse magnetron sputtering

Sergei Zenkin, Fedor Konusov, Aleksandr Lauk, Denis Zelentsov, Stanislav Demchenko

Research output: Contribution to journalArticle


This article reports on the influence of the sputtering parameters (discharge voltage, average target power density) of a high power impulse magnetron discharge (HiPIMS) on the structure, mechanical and optical properties of silicon-rich Al-Si-N films. We show that with the change of a discharge target power density in the range of 30-120 W/cm2, the hardness of the sputtered Al-Si-N films nonlinearly changes in the range of 22-29 GPa, while the concentration of the absorption centers changes in the range of 1018-1020/cm3. The optical spectra of the HiPIMS sputtered films are completely different from the Al-Si-N films prepared by a direct current magnetron sputtering, with an absence of "monoenergetic" optical absorption centers, which are attributed to point defects.

Original languageEnglish
Article number53
Issue number1
Publication statusPublished - 17 Jan 2019



  • Al-Si-N
  • HiPIMS
  • Microstructure
  • Silicon nitride

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Materials Chemistry
  • Surfaces and Interfaces

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