Abstract
The article presents a detailed analysis of the structure-hardness relations in Zr-Cu-N and Zr-Ti-Cu-N films with low and high Ti content. These films were sputter deposited using a dc unbalanced magnetron equipped with a composed target, i.e. a round plate of diameter 100 mm made of ZrCu (90/10 at.%) alloy with a Ti (99.5%) fixing ring. The use of the Ti fixing ring of two internal diameters (70 or 50 mm) makes it possible to prepare Zr-Ti-Cu-N films with different Ti content, approximately with 15 or 50 at.%, respectively. The properties of the Zr-Ti-Cu-N films were compared with those of Zr-Cu-N films reactively sputtered from the same magnetron but equipped with a ZrCu (90/10 at.%) target in a mixture of argon and nitrogen at a total pressure pT = pAr + pN2 = 0.7 Pa. It was found that (i) nanostructured Zr-Cu-N and Zr-Ti-Cu-N films can form superhard materials with hardness H greater than 40 GPa, (ii) there is a strong correlation between the structure and the hardness of the films, (iii) the films with a maximum hardness Hmax are composed of a mixture of grains of different crystallographic orientations and (iv) there is no correlation between Hmax of superhard films, their stoichiometry x = N/(Zr + Ti) and Ti content in the film.
| Original language | English |
|---|---|
| Pages (from-to) | 243-253 |
| Number of pages | 11 |
| Journal | Surface and Coatings Technology |
| Volume | 166 |
| Issue number | 2-3 |
| DOIs | |
| Publication status | Published - 24 Mar 2003 |
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Keywords
- Magnetron sputtering
- Mechanical properties
- Structure
- Superhardness
- Zr-Ti-Cu-N films
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry
Cite this
Structure and mechanical properties of magnetron sputtered Zr-Ti-Cu-N films. / Musil, J.; Daniel, R.
In: Surface and Coatings Technology, Vol. 166, No. 2-3, 24.03.2003, p. 243-253.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Structure and mechanical properties of magnetron sputtered Zr-Ti-Cu-N films
AU - Musil, J.
AU - Daniel, R.
PY - 2003/3/24
Y1 - 2003/3/24
N2 - The article presents a detailed analysis of the structure-hardness relations in Zr-Cu-N and Zr-Ti-Cu-N films with low and high Ti content. These films were sputter deposited using a dc unbalanced magnetron equipped with a composed target, i.e. a round plate of diameter 100 mm made of ZrCu (90/10 at.%) alloy with a Ti (99.5%) fixing ring. The use of the Ti fixing ring of two internal diameters (70 or 50 mm) makes it possible to prepare Zr-Ti-Cu-N films with different Ti content, approximately with 15 or 50 at.%, respectively. The properties of the Zr-Ti-Cu-N films were compared with those of Zr-Cu-N films reactively sputtered from the same magnetron but equipped with a ZrCu (90/10 at.%) target in a mixture of argon and nitrogen at a total pressure pT = pAr + pN2 = 0.7 Pa. It was found that (i) nanostructured Zr-Cu-N and Zr-Ti-Cu-N films can form superhard materials with hardness H greater than 40 GPa, (ii) there is a strong correlation between the structure and the hardness of the films, (iii) the films with a maximum hardness Hmax are composed of a mixture of grains of different crystallographic orientations and (iv) there is no correlation between Hmax of superhard films, their stoichiometry x = N/(Zr + Ti) and Ti content in the film.
AB - The article presents a detailed analysis of the structure-hardness relations in Zr-Cu-N and Zr-Ti-Cu-N films with low and high Ti content. These films were sputter deposited using a dc unbalanced magnetron equipped with a composed target, i.e. a round plate of diameter 100 mm made of ZrCu (90/10 at.%) alloy with a Ti (99.5%) fixing ring. The use of the Ti fixing ring of two internal diameters (70 or 50 mm) makes it possible to prepare Zr-Ti-Cu-N films with different Ti content, approximately with 15 or 50 at.%, respectively. The properties of the Zr-Ti-Cu-N films were compared with those of Zr-Cu-N films reactively sputtered from the same magnetron but equipped with a ZrCu (90/10 at.%) target in a mixture of argon and nitrogen at a total pressure pT = pAr + pN2 = 0.7 Pa. It was found that (i) nanostructured Zr-Cu-N and Zr-Ti-Cu-N films can form superhard materials with hardness H greater than 40 GPa, (ii) there is a strong correlation between the structure and the hardness of the films, (iii) the films with a maximum hardness Hmax are composed of a mixture of grains of different crystallographic orientations and (iv) there is no correlation between Hmax of superhard films, their stoichiometry x = N/(Zr + Ti) and Ti content in the film.
KW - Magnetron sputtering
KW - Mechanical properties
KW - Structure
KW - Superhardness
KW - Zr-Ti-Cu-N films
UR - http://www.scopus.com/inward/record.url?scp=0037464378&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0037464378&partnerID=8YFLogxK
U2 - 10.1016/S0257-8972(02)00819-8
DO - 10.1016/S0257-8972(02)00819-8
M3 - Article
AN - SCOPUS:0037464378
VL - 166
SP - 243
EP - 253
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
SN - 0257-8972
IS - 2-3
ER -