Structural features of N-containing titanium dioxide thin films deposited by magnetron sputtering

Alla A. Pustovalova, Vladimir F. Pichugin, Nina M. Ivanova, Michael Bruns

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

N-containing titanium dioxide (N-TiO2) thin films have been obtained by the midrange magnetron sputtering with two-component N2/O2 reactive working gas. Complex analysis of the films structure and phase composition demonstrates its significant changes due to nitrogen content. X-ray diffraction data show the anatase-rutile phase transition and crystallites size reduction in N-TiO2 thin films with increase of nitrogen content in the reactive atmosphere. The investigation has been focused on phase transition, zeta potential, chemical bonds and UV-light influence on the wettability of the films versus nitrogen concentration. Hydrophilization of N-TiO2 films surface under UV-light has an irreversible character.

Original languageEnglish
Pages (from-to)9-16
Number of pages8
JournalThin Solid Films
Volume627
DOIs
Publication statusPublished - 1 Apr 2017

Fingerprint

titanium oxides
Magnetron sputtering
Titanium dioxide
magnetron sputtering
Nitrogen
nitrogen
Ultraviolet radiation
Thin films
thin films
Phase transitions
Chemical bonds
Zeta potential
chemical bonds
wettability
Crystallites
Phase composition
anatase
rutile
crystallites
Wetting

Keywords

  • Magnetron sputtering
  • Nitrogen addition
  • Structure
  • Thin films
  • Titanium dioxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Structural features of N-containing titanium dioxide thin films deposited by magnetron sputtering. / Pustovalova, Alla A.; Pichugin, Vladimir F.; Ivanova, Nina M.; Bruns, Michael.

In: Thin Solid Films, Vol. 627, 01.04.2017, p. 9-16.

Research output: Contribution to journalArticle

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