Structural features of N-containing titanium dioxide thin films deposited by magnetron sputtering

Alla A. Pustovalova, Vladimir F. Pichugin, Nina M. Ivanova, Michael Bruns

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

N-containing titanium dioxide (N-TiO2) thin films have been obtained by the midrange magnetron sputtering with two-component N2/O2 reactive working gas. Complex analysis of the films structure and phase composition demonstrates its significant changes due to nitrogen content. X-ray diffraction data show the anatase-rutile phase transition and crystallites size reduction in N-TiO2 thin films with increase of nitrogen content in the reactive atmosphere. The investigation has been focused on phase transition, zeta potential, chemical bonds and UV-light influence on the wettability of the films versus nitrogen concentration. Hydrophilization of N-TiO2 films surface under UV-light has an irreversible character.

Original languageEnglish
Pages (from-to)9-16
Number of pages8
JournalThin Solid Films
Volume627
DOIs
Publication statusPublished - 1 Apr 2017

Keywords

  • Magnetron sputtering
  • Nitrogen addition
  • Structure
  • Thin films
  • Titanium dioxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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