Structural features and nitrogen positions in titanium oxynitride films grown in plasma of magnetron discharge

V. F. Pichugin, A. A. Pustovalova, K. E. Evdokimov, M. E. Konishchev, O. S. Kuzmin, E. L. Boytsova, Nataliia Beshchasna, Anton Ficai, D. M. Aubakirova, Zhilei Sun

Research output: Contribution to journalConference article

Abstract

The paper addresses the results of the analysis of the structural features of nitrogen-containing titanium oxides films, deposited by reactive magnetron sputtering. The films have a nanocrystalline two-phase structure and consist of anatase and rutile crystallites, regardless of the coating deposition regimes. No traces of titanium nitride phase are found in the film and nitrogen atoms in oxide form are localized at the grain boundaries of the deposited film.

Original languageEnglish
Article number012062
JournalJournal of Physics: Conference Series
Volume1281
Issue number1
DOIs
Publication statusPublished - 12 Aug 2019
Event14th International Conference on Films and Coatings, ICFC 2019 - Saint Petersburg, Russian Federation
Duration: 14 May 201916 May 2019

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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