Structural changes of titanium dioxide thin films deposited by reactive magnetron sputtering through nitrogen incorporation

Alla Pustovalova, Nina Ivanova

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

This paper presents the results of the studies of the structure and chemical composition of nitrogen-doped titanium dioxide thin films obtained by reactive magnetron sputtering deposition. The XRD data show the changes of the structure and phase composition of titanium dioxide thin films due to the nitrogen doping. The change of the films structure increases with the growth of the nitrogen content. The reduction of crystallites size takes place at the increase of the nitrogen concentration. Chemical bonds present in the films were examined by FTIR spectroscopy.

Original languageEnglish
Title of host publicationMultifunctional Materials
Subtitle of host publicationDevelopment and Application
EditorsIrina Kurzina, Anna Godymchuk
PublisherTrans Tech Publications Ltd
Pages383-388
Number of pages6
ISBN (Print)9783038357292
DOIs
Publication statusPublished - 1 Jan 2016
Event12th International Conference on Prospects of Fundamental Sciences Development, PFSD 2015 - Tomsk, Russian Federation
Duration: 21 Apr 201524 Apr 2015

Publication series

NameKey Engineering Materials
Volume683
ISSN (Print)1013-9826

Conference

Conference12th International Conference on Prospects of Fundamental Sciences Development, PFSD 2015
CountryRussian Federation
CityTomsk
Period21.4.1524.4.15

Fingerprint

Reactive sputtering
Magnetron sputtering
Titanium dioxide
Nitrogen
Thin films
Chemical bonds
Crystallites
Phase composition
Doping (additives)
Spectroscopy
titanium dioxide
Chemical analysis

Keywords

  • Magnetron sputtering
  • Nitrogen doping
  • Phase transition
  • Thin films
  • Titanium dioxide
  • X-ray diffraction

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Pustovalova, A., & Ivanova, N. (2016). Structural changes of titanium dioxide thin films deposited by reactive magnetron sputtering through nitrogen incorporation. In I. Kurzina, & A. Godymchuk (Eds.), Multifunctional Materials: Development and Application (pp. 383-388). (Key Engineering Materials; Vol. 683). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/KEM.683.383

Structural changes of titanium dioxide thin films deposited by reactive magnetron sputtering through nitrogen incorporation. / Pustovalova, Alla; Ivanova, Nina.

Multifunctional Materials: Development and Application. ed. / Irina Kurzina; Anna Godymchuk. Trans Tech Publications Ltd, 2016. p. 383-388 (Key Engineering Materials; Vol. 683).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Pustovalova, A & Ivanova, N 2016, Structural changes of titanium dioxide thin films deposited by reactive magnetron sputtering through nitrogen incorporation. in I Kurzina & A Godymchuk (eds), Multifunctional Materials: Development and Application. Key Engineering Materials, vol. 683, Trans Tech Publications Ltd, pp. 383-388, 12th International Conference on Prospects of Fundamental Sciences Development, PFSD 2015, Tomsk, Russian Federation, 21.4.15. https://doi.org/10.4028/www.scientific.net/KEM.683.383
Pustovalova A, Ivanova N. Structural changes of titanium dioxide thin films deposited by reactive magnetron sputtering through nitrogen incorporation. In Kurzina I, Godymchuk A, editors, Multifunctional Materials: Development and Application. Trans Tech Publications Ltd. 2016. p. 383-388. (Key Engineering Materials). https://doi.org/10.4028/www.scientific.net/KEM.683.383
Pustovalova, Alla ; Ivanova, Nina. / Structural changes of titanium dioxide thin films deposited by reactive magnetron sputtering through nitrogen incorporation. Multifunctional Materials: Development and Application. editor / Irina Kurzina ; Anna Godymchuk. Trans Tech Publications Ltd, 2016. pp. 383-388 (Key Engineering Materials).
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