Stress analyses of high spatial resolution on TSV and BEoL structures

D. Vogel, E. Auerswald, J. Auersperg, P. Bayat, R. D. Rodriguez, D. R.T. Zahn, S. Rzepka, B. Michel

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Knowledge and control of local stress development in Back-End-of-Line (BEoL) stacks and nearby Through Silicon Vias (TSVs) in advanced 3D integrated devices is a key to their thermo-mechanical reliability. The paper presents a combined simulation/measurement approach to evaluate stresses generated in the result of the TSV and BEoL stack manufacturing and 3D bonding processes. Stress measurement methods of high spatial resolution capability (microRaman and Focused Ion Beam (FIB) based stress release techniques) are used to obtain stress data from real components as manufactured. Finite Element Analysis (FEA) allows a more accurate interpretation of measurements results as well as a subsequent comprehensive analysis of failure behaviour. The paper gives an introduction to the applied local stress measurement on advanced multi-layer systems and 3D integration components referring to the state-of-art capabilities and limitations. The need of experimental stress data generation is illustrated on FEA examples. Illustration is given for FEA applications on 3D IC integration components currently lacking appropriate residual stress input for an assumed initial state.

Original languageEnglish
Pages (from-to)1963-1968
Number of pages6
JournalMicroelectronics Reliability
Volume54
Issue number9-10
DOIs
Publication statusPublished - 1 Sep 2014
Externally publishedYes

Fingerprint

Silicon
spatial resolution
high resolution
silicon
stress measurement
Stress measurement
Finite element method
Focused ion beams
residual stress
Residual stresses
manufacturing
ion beams
simulation

Keywords

  • BEoL
  • Digital Image Correlation
  • Finite Element Analysis
  • MicroRaman
  • Stress
  • TSV

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Safety, Risk, Reliability and Quality
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Cite this

Vogel, D., Auerswald, E., Auersperg, J., Bayat, P., Rodriguez, R. D., Zahn, D. R. T., ... Michel, B. (2014). Stress analyses of high spatial resolution on TSV and BEoL structures. Microelectronics Reliability, 54(9-10), 1963-1968. https://doi.org/10.1016/j.microrel.2014.07.098

Stress analyses of high spatial resolution on TSV and BEoL structures. / Vogel, D.; Auerswald, E.; Auersperg, J.; Bayat, P.; Rodriguez, R. D.; Zahn, D. R.T.; Rzepka, S.; Michel, B.

In: Microelectronics Reliability, Vol. 54, No. 9-10, 01.09.2014, p. 1963-1968.

Research output: Contribution to journalArticle

Vogel, D, Auerswald, E, Auersperg, J, Bayat, P, Rodriguez, RD, Zahn, DRT, Rzepka, S & Michel, B 2014, 'Stress analyses of high spatial resolution on TSV and BEoL structures', Microelectronics Reliability, vol. 54, no. 9-10, pp. 1963-1968. https://doi.org/10.1016/j.microrel.2014.07.098
Vogel, D. ; Auerswald, E. ; Auersperg, J. ; Bayat, P. ; Rodriguez, R. D. ; Zahn, D. R.T. ; Rzepka, S. ; Michel, B. / Stress analyses of high spatial resolution on TSV and BEoL structures. In: Microelectronics Reliability. 2014 ; Vol. 54, No. 9-10. pp. 1963-1968.
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