Sources of high power ion beams for technological applications

I. F. Isakov, V. N. Kolodii, M. S. Opekunov, V. M. Matvienko, S. A. Pechenkin, G. E. Remnev, Yury Petrovich Usov

Research output: Contribution to journalArticle

35 Citations (Scopus)

Abstract

This report describes two sources of high power ion beams of nanosecond duration. The first one produces ions with energy up to 125 keV, pulse duration from 20 to 200 ns, current density for heavy ions (Al+, Mg+, Fe+, W+, etc.) 1-2 A cm-2 and energy of 12 to 120 J deposited by the beam. The second one produces, respectively, 300 keV, 50 ns, 40 to 200 A cm-2 current of H+ and C+ ions and a kJ energy. The sources are powered by various diode systems and can be applied to scientific research and technology for materials science.

Original languageEnglish
Pages (from-to)159-162
Number of pages4
JournalVacuum
Volume42
Issue number1-2
DOIs
Publication statusPublished - 1991

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

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    Isakov, I. F., Kolodii, V. N., Opekunov, M. S., Matvienko, V. M., Pechenkin, S. A., Remnev, G. E., & Usov, YP. (1991). Sources of high power ion beams for technological applications. Vacuum, 42(1-2), 159-162. https://doi.org/10.1016/0042-207X(91)90101-N