Sources and methods of repetitively pulsed ion/plasma material treatment

A. I. Ryabchikov, R. A. Nasyrov

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

A brief review is presented on repetitively pulsed "Raduga 1-4" ion sources based on evaporation of the cathode material by vacuum arc. Their operation principles and functional possibilities are described. "Raduga-1,3" ion sources provide a formation of one component and multicomponent, not composition-controlled high intensity ion beams. Ion sources "Raduga-2,4" generate energy/composition-controlled multicomponent ion beams. Operation conditions of the sources providing a treatment of the details of complex shape as well as ion plasma treatment of the target are given. Features and prospects of the methods of repetitively pulsed multielement and high concentration implantation are discussed. The method of repetitively pulsed high concentration implantation is realized under ion/plasma operating conditions of the ion source "Raduga" and ion sputtering compensation of the target by plasma deposition.

Original languageEnglish
Pages (from-to)2428-2430
Number of pages3
JournalReview of Scientific Instruments
Volume63
Issue number4
DOIs
Publication statusPublished - 1992

Fingerprint

Ion sources
ion sources
Plasmas
Ions
Ion beams
implantation
ions
ion beams
Plasma deposition
Chemical analysis
Ion implantation
Sputtering
Evaporation
Cathodes
arcs
cathodes
sputtering
evaporation
Vacuum
vacuum

ASJC Scopus subject areas

  • Instrumentation
  • Physics and Astronomy (miscellaneous)

Cite this

Sources and methods of repetitively pulsed ion/plasma material treatment. / Ryabchikov, A. I.; Nasyrov, R. A.

In: Review of Scientific Instruments, Vol. 63, No. 4, 1992, p. 2428-2430.

Research output: Contribution to journalArticle

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