Some regularities of modification of the real silicon surface by electrochemically activated solutions of sulfuric acid

Abstract

The effect of electrochemically activated solutions of sulfuric acid on the state of the real surface of technological silicon plates is studied. It is shown that the most intense change in the zone of surface states occurs for the first 10 min of the interaction. The authors believe that the treatment of the silicon surface by chemically activated solutions of sulfuric acid results in chemical modification of the real surface, but not in deep cleaning.

Original language	English
Pages (from-to)	1275-1280
Number of pages	6
Journal	Surface Investigation X-Ray, Synchrotron and Neutron Techniques
Volume	12
Issue number	11
Publication status	Published - 1997

ASJC Scopus subject areas

Surfaces and Interfaces

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Some regularities of modification of the real silicon surface by electrochemically activated solutions of sulfuric acid. / Nikitenkov, N. N.; Chernova, E. E.; Karbainov, Yu A.; Markova, N. M.; Khakhanina, T. I.

In: Surface Investigation X-Ray, Synchrotron and Neutron Techniques, Vol. 12, No. 11, 1997, p. 1275-1280.

Research output: Contribution to journal › Article › peer-review

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abstract = "The effect of electrochemically activated solutions of sulfuric acid on the state of the real surface of technological silicon plates is studied. It is shown that the most intense change in the zone of surface states occurs for the first 10 min of the interaction. The authors believe that the treatment of the silicon surface by chemically activated solutions of sulfuric acid results in chemical modification of the real surface, but not in deep cleaning.",

author = "Nikitenkov, {N. N.} and Chernova, {E. E.} and Karbainov, {Yu A.} and Markova, {N. M.} and Khakhanina, {T. I.}",

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AU - Nikitenkov, N. N.

AU - Chernova, E. E.

AU - Karbainov, Yu A.

AU - Markova, N. M.

AU - Khakhanina, T. I.

PY - 1997

Y1 - 1997

N2 - The effect of electrochemically activated solutions of sulfuric acid on the state of the real surface of technological silicon plates is studied. It is shown that the most intense change in the zone of surface states occurs for the first 10 min of the interaction. The authors believe that the treatment of the silicon surface by chemically activated solutions of sulfuric acid results in chemical modification of the real surface, but not in deep cleaning.

AB - The effect of electrochemically activated solutions of sulfuric acid on the state of the real surface of technological silicon plates is studied. It is shown that the most intense change in the zone of surface states occurs for the first 10 min of the interaction. The authors believe that the treatment of the silicon surface by chemically activated solutions of sulfuric acid results in chemical modification of the real surface, but not in deep cleaning.

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Some regularities of modification of the real silicon surface by electrochemically activated solutions of sulfuric acid

Abstract

ASJC Scopus subject areas

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