SIMS and RBS investigations of implanted layers

V. M. Zavodchikov, N. N. Nikitenkov, L. N. Puchkaryova, A. A. Yatis

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Abstract

Niobium and ARMCO iron were implanted with nanosecond pulses of 0.4-0.6 MeV carbon ions and niobium and beryllium with microsecond pulses of 80 keV tungsten ions. The implanted samples were investigated by Secondary Ion Mass Spectrometry (SIMS) and Rutherford back-scattering (RBS). A surface layer of 500-1000 Å in thickness has been found to differ from that of the unirradiated targets by a higher content of foreign and bulk impurities as well as in the values of the surface-binding energy A and the electron work function θ{symbol}. Pulse implantation of carbon has been found to result in formation of laminated structure in iron through the whole analyzed depth of ≈ 5 μm with interchanging carbide and austenite layers. A method for calculation of the unknown parameters A and θ{symbol} based on SIMS energy spectra is further presented.

Original languageEnglish
Pages (from-to)62-65
Number of pages4
JournalNuclear Inst. and Methods in Physics Research, B
Volume17
Issue number1
DOIs
Publication statusPublished - 1986

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ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Instrumentation
  • Surfaces and Interfaces

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